SCHEMBL2594564

SCHEMBL2594564

CCCCCCCCC(c1ccccc1)S(=O)(=O)O

nearest known ligand 0.52

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
NAAA Q02083 3/20 0.48
TP53 P04637 1/20 0.44
SRC P12931 1/20 0.44
CTRC Q99895 1/20 0.43
ASAH1 Q13510 2/20 0.42
CSNK1E P49674 1/20 0.42
GPR84 Q9NQS5 3/20 0.42
FFAR1 O14842 1/20 0.42
ALDH1A1 P00352 2/20 0.41
ACER2 Q5QJU3 1/20 0.41
POLB P06746 1/20 0.41
NR1I2 O75469 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15543389 1.00 NAAA (0.48) NAAATP53SRCCTRCASAH1
SCHEMBL7784175 1.00 NAAA (0.48) NAAATP53SRCCTRCASAH1
SCHEMBL3141001 1.00 NAAA (0.48) NAAATP53SRCCTRCASAH1
SCHEMBL3127159 1.00 NAAA (0.48) NAAATP53SRCCTRCASAH1
SCHEMBL9809203 1.00 NAAA (0.48) NAAATP53SRCCTRCASAH1
SCHEMBL7787199 1.00 NAAA (0.48) NAAATP53SRCCTRCASAH1
SCHEMBL5701092 1.00 NAAA (0.48) NAAATP53SRCCTRCASAH1
SCHEMBL57427 1.00 NAAA (0.48) NAAATP53SRCCTRCASAH1
SCHEMBL6117900 1.00 NAAA (0.48) NAAATP53SRCCTRCASAH1
SCHEMBL3616787 1.00 NAAA (0.48) NAAATP53SRCCTRCASAH1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250020997-A1 PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CIRCUIT DEVICES USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2025-01-16 US disclosed
EP-1676835-B1 PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT WAKO PURE CHEM IND LTD (JP) 2014-12-10 EP disclosed
US-8669375-B2 Process for producing ester compound WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2014-03-11 US disclosed
US-20130066070-A1 PROCESS FOR PRODUCING ESTER COMPOUND WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2013-03-14 US disclosed
US-8318964-B2 Process for producing ester compound WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2012-11-27 US disclosed
WO-2011135401-A1 POLYSACCHARIDES COMPRISING CARBOXYL FUNCTIONAL GROUPS SUBSTITUTED BY ESTERIFICATION BY A HYDROPHOBIC ALCOHOL ADOCIA (FR) 2011-11-03 WO disclosed
US-20100324314-A1 PROCESS FOR PRODUCING ESTER COMPOUND WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2010-12-23 US disclosed
US-7833691-B2 Heterocycle-bearing onium salts WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2010-11-16 US disclosed
EP-1953149-B1 A heterocycle-containing onium salt WAKO PURE CHEM IND LTD (JP) 2010-10-06 EP disclosed
US-7642368-B2 for use as acid generator in semiconductor manufacture; triarylsulfonium salt having a structure that only one aromatic ring of three is different, in a high yield and by-product inhibition; reacting a diaryl sulfoxide with an aryl Grignard reagent in presence of chlorotrialkylsilane and strong acid WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2010-01-05 US disclosed
EP-1472302-A2 POLYCARBONATE RESIN COMPOSITION FOR OPTICAL APPLICATIONS AND METHODS FOR MANUFACTURE THEREOF GENERAL ELECTRIC COMPANY (US) 2004-11-03 EP disclosed
EP-1443042-A1 HYBRID ONIUM SALT Wako Pure Chemical Industries, Ltd. (JP) 2004-08-04 EP disclosed
WO-2003106399-A2 PROCESS FOR PREPARING N-PROTECTED β-AMINO ALDEHYDE COMPOUNDS THERAVANCE, INC. (US) 2003-12-24 WO disclosed
WO-2002046272-A2 POLYCARBONATE RESIN COMPOSITION FOR OPTICAL APPLICATIONS AND METHODS FOR MANUFACTURE THEREOF GENERAL ELECTRIC COMPANY (US) 2002-06-13 WO disclosed
EP-0803548-B1 Colored thermoplastic resin composition ORIENT CHEMICAL IND (JP) 2001-10-24 EP disclosed
US-5827911-A BLACK DYE IS OBTAINED BY REACTION OF NIGROSINE AND ATLEAST ONE ANIONIC SURFACTANT SELECTED FROM SULFURIC ACID ESTER OR SALTS, PHSOPHORIC ACID ESTER OR SALTS, SULFONIC ACID OR SALTS AND CARBOXYLIC ACID OR SALTS ORIENT CHEMICAL INDUSTRIES, LTD. (JP) 1998-10-27 US disclosed
EP-0803548-A2 Colored thermoplastic resin composition ORIENT CHEMICAL INDUSTRIES, LTD. (JP) 1997-10-29 EP disclosed
US-4482670-A DEACTIVATION OF ACID CATALYST USING LEWIS BASE; CURING; DIELECTRICS; SEALANTS; GREASES DOW CORNING CORPORATION (US) 1984-11-13 US disclosed
EP-0119816-A2 Method of polymerizing polydiorganosiloxane fluid-filler mixture using sulfuric acid or sulfonic acids as catalysts DOW CORNING CORPORATION (US) 1984-09-26 EP disclosed
US-4009085-A ELECTRODEPOSITION OF CHROMIUM OXIDE M & T CHEMICALS INC. (US) 1977-02-22 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20130066070-A1 PROCESS FOR PRODUCING ESTER COMPOUND ADH1C, ADH5, ADH1A NAAA 54/4885TP53 1748/4885SRC 2380/4885
US-20100324314-A1 PROCESS FOR PRODUCING ESTER COMPOUND ADH1C, ADH5, ADH1A NAAA 55/4885TP53 2027/4885SRC 2958/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.