SCHEMBL25946604

SCHEMBL25946604

CC(OC(=O)CI)C(=O)O

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MMP1 P03956 1/20 0.42
MMP2 P08253 1/20 0.42
MMP3 P08254 1/20 0.42
MMP9 P14780 1/20 0.42
MMP13 P45452 1/20 0.42
SLC7A5 Q01650 2/20 0.33
TP53 P04637 1/20 0.33
TSHR P16473 1/20 0.31
SLC1A3 P43003 1/20 0.31
SLC1A2 P43004 1/20 0.31
SLC1A1 P43005 1/20 0.31
CYP1A2 P05177 2/20 0.31
GAA P10253 1/20 0.31
CYP2C9 P11712 1/20 0.31
PKM P14618 1/20 0.31
CYP2C19 P33261 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
KMT2A Q03164 1/20 0.31
GABRR1 P24046 2/20 0.30
RNPEP Q9H4A4 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7110445 0.80 LMNA (0.40) MMP1MMP2MMP3MMP9MMP13
SCHEMBL2608669 0.80 LMNA (0.40) MMP1MMP2MMP3MMP9MMP13
SCHEMBL823240 0.78 MMP1 (0.39) MMP1MMP2MMP3MMP9MMP13
SCHEMBL2610011 0.78 MMP1 (0.39) MMP1MMP2MMP3MMP9MMP13
SCHEMBL682062 0.78 MMP1 (0.39) MMP1MMP2MMP3MMP9MMP13
SCHEMBL2044655 0.78 MMP1 (0.39) MMP1MMP2MMP3MMP9MMP13
SCHEMBL7975753 0.77
SCHEMBL31529680 0.76 TSHR (0.44) MMP1MMP2MMP3MMP9MMP13
SCHEMBL13624500 0.76 MMP1 (0.38) MMP1MMP2MMP3MMP9MMP13
SCHEMBL28496796 0.76 MMP1 (0.38) MMP1MMP2MMP3MMP9MMP13

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240027902-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-01-25 US disclosed
US-11720020-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-08 US disclosed