Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | PTGDR2 | Q9Y5Y4 | 1/20 | 0.32 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.32 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.31 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.31 |
| ▸ | CHRM5 | P08912 | 1/20 | 0.31 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.31 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.31 |
| ▸ | ELANE | P08246 | 1/20 | 0.30 |
| ▸ | CD69 | Q07108 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29664486 | 0.86 | ALDH1A1 (0.38) | POLBGAANPSR1ALDH1A1TSHR | |
| SCHEMBL14507455 | 0.86 | ALDH1A1 (0.38) | POLBGAANPSR1ALDH1A1TSHR | |
| SCHEMBL36866 | 0.83 | POLB (0.41) | POLBGAANPSR1ALDH1A1TSHR | |
| SCHEMBL19432682 | 0.81 | THRB (0.34) | SMN1; SMN2ALDH1A1TSHRPTGDR2PTGS1 | |
| SCHEMBL19393387 | 0.81 | THRB (0.38) | POLBGAANPSR1ALDH1A1TSHR | |
| SCHEMBL25946810 | 0.81 | SMN1; SMN2 (0.38) | SMN1; SMN2POLBGAANPSR1ALDH1A1 | |
| SCHEMBL25946599 | 0.81 | THRB (0.32) | SMN1; SMN2ALDH1A1TSHR | |
| SCHEMBL18286498 | 0.78 | TSHR (0.40) | SMN1; SMN2POLBGAANPSR1ALDH1A1 | |
| SCHEMBL17461770 | 0.78 | ALDH1A1 (0.38) | POLBGAANPSR1ALDH1A1TSHR | |
| SCHEMBL14879869 | 0.78 | MAPK1 (0.34) | SMN1; SMN2PTGDR2PTGS1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240027902-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20240027902-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-11720020-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-08-08 | — | — | US | disclosed |
| US-11720020-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-08-08 | — | — | US | disclosed |