SCHEMBL25960280

SCHEMBL25960280

CN(C(=O)OC(C)(C)C)c1ccc(OCCC[SiH3])cc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PAX8 Q06710 1/20 0.43
POLB P06746 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
HDAC1 Q13547 1/20 0.41
RXRA P19793 2/20 0.41
NR1H2 P55055 2/20 0.41
NR1H3 Q13133 2/20 0.41
CA12 O43570 5/20 0.40
CA1 P00915 5/20 0.40
CA2 P00918 5/20 0.40
CA9 Q16790 5/20 0.40
MEN1 O00255 1/20 0.40
RAB9A P51151 1/20 0.40
KMT2A Q03164 1/20 0.40
NPSR1 Q6W5P4 1/20 0.40
KDM4E B2RXH2 1/20 0.39
ALDH1A1 P00352 1/20 0.39
GPR119 Q8TDV5 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
PDK2 Q15119 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25960279 0.88 PAX8 (0.44) PAX8POLBSMN1; SMN2RXRANR1H2
SCHEMBL25960317 0.88 POLB (0.39) POLBSMN1; SMN2HDAC1MEN1RAB9A
SCHEMBL3365028 0.86 L3MBTL1 (0.43) PAX8POLBSMN1; SMN2HDAC1RXRA
SCHEMBL3367105 0.85 GAA (0.44) PAX8HDAC1CA12CA1CA2
SCHEMBL3368971 0.85 GAA (0.44) PAX8HDAC1CA12CA1CA2
SCHEMBL25960268 0.83 PAX8 (0.45) PAX8SMN1; SMN2HDAC1NR1H2NR1H3
SCHEMBL8018111 0.81 PAX8 (0.55) PAX8SMN1; SMN2RXRANR1H2NR1H3
SCHEMBL16681965 0.80 GPR119 (0.46) PAX8POLBSMN1; SMN2RXRANR1H2
SCHEMBL16681968 0.80 PAX8 (0.43) PAX8POLBSMN1; SMN2RXRANR1H2
SCHEMBL15809946 0.80 LTB4R (0.51) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230244149-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-03 US disclosed