SCHEMBL25969103

SCHEMBL25969103

CC(=O)N(C(C)=O)c1cccc2c(O)cccc12

nearest known ligand 0.81

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 3/20 0.81
EP300 Q09472 2/20 0.44
KAT2B Q92831 2/20 0.44
KAT8 Q9H7Z6 2/20 0.44
THRB P10828 2/20 0.42
CDK2 P24941 1/20 0.40
IDO1 P14902 2/20 0.39
HSD17B10 Q99714 3/20 0.39
CYP1A2 P05177 2/20 0.39
HPGD P15428 2/20 0.39
KDM4E B2RXH2 2/20 0.39
ALDH1A1 P00352 1/20 0.39
LMNA P02545 1/20 0.39
CYP3A4 P08684 1/20 0.39
PARP1 P09874 1/20 0.39
CYP2C9 P11712 1/20 0.39
RAB9A P51151 1/20 0.39
BLM P54132 1/20 0.39
PARP15 Q460N3 1/20 0.39
MAPT P10636 3/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7189996 0.89 GAA (0.68) GAAEP300KAT2BKAT8IDO1
SCHEMBL8026157 0.83 GAA (0.55) GAAEP300KAT2BKAT8THRB
SCHEMBL11565235 0.81 GAA (0.61) GAATHRBHSD17B10HPGDKDM4E
SCHEMBL25969085 0.80 GAA (0.61) GAATHRBCDK2HSD17B10HPGD
Acetone SCHEMBL8517127 0.79 THRB (0.56) GAATHRBCDK2IDO1HSD17B10
SCHEMBL11024265 0.78 GAA (0.77) GAACYP1A2HPGDKDM4EALDH1A1
SCHEMBL25969104 0.76 GAA (0.55) GAATHRBCDK2HSD17B10HPGD
SCHEMBL3582015 0.75 EP300 (0.73) GAAEP300KAT2BKAT8THRB
SCHEMBL21513960 0.74 GAA (0.70) GAAHSD17B10ALDH1A1LMNACYP3A4
SCHEMBL25969091 0.73 THRB (0.56) GAATHRBCDK2HSD17B10HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230260787-A1 COMPOSITION FOR FORMING PROTECTIVE FILM AGAINST ALKALINE AQUEOUS HYDROGEN PEROXIDE, SUBSTRATE FOR PRODUCING SEMICONDUCTOR APPARATUS, METHOD FOR FORMING PROTECTIVE FILM, AND METHOD FOR FORMING PATTERN SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-17 US disclosed