Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 2/20 | 0.34 |
| ▸ | CA2 | P00918 | 2/20 | 0.34 |
| ▸ | CA12 | O43570 | 1/20 | 0.30 |
| ▸ | CA9 | Q16790 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2601704 | 0.88 | CA2 (0.42) | CA1CA2CA12CA9 | |
| SCHEMBL17052475 | 0.86 | — | — | |
| SCHEMBL10224671 | 0.78 | MLNR (0.31) | — | |
| SCHEMBL2601705 | 0.78 | CA12 (0.31) | CA1CA2CA12CA9 | |
| SCHEMBL13563625 | 0.75 | RIPK1 (0.34) | — | |
| SCHEMBL16282522 | 0.74 | CYP3A4 (0.32) | — | |
| SCHEMBL3434648 | 0.74 | EPHX1 (0.37) | — | |
| SCHEMBL18253510 | 0.73 | CHRM1 (0.32) | — | |
| SCHEMBL14884042 | 0.73 | CHRM1 (0.33) | — | |
| SCHEMBL10183697 | 0.73 | APOBEC3A (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8987386-B2 | Method of producing polymeric compound, resist composition, and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-03-24 | — | — | US | disclosed |
| US-8440385-B2 | Positive resist composition, method of forming resist pattern and polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-05-14 | — | — | US | disclosed |
| US-20120328993-A1 | METHOD OF PRODUCING POLYMERIC COMPOUND, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-12-27 | — | — | US | disclosed |
| US-20120100487-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-04-26 | — | — | US | disclosed |
| US-20110244392-A1 | POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-10-06 | — | — | US | disclosed |