Malic Acid

Malic Acid

SCHEMBL260319

C=C(C)C(=O)OCCO.O=C(O)CC(O)C(=O)O

nearest known ligand 0.48

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

CACNA1CCACNA1DCACNA1FCACNA1SDRD2HTR1BHTR1DHTR1F

The experimentally established mechanism targets of Malic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 1/20 0.48
THRB P10828 1/20 0.42
TSHR P16473 4/20 0.41
TET2 Q6N021 3/20 0.39
TET3 O43151 1/20 0.39
TET1 Q8NFU7 1/20 0.39
POLB P06746 1/20 0.35
APEX1 P27695 1/20 0.35
HTT P42858 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
ALDH1A1 P00352 2/20 0.33
OR51E2 Q9H255 1/20 0.32
TGFBR1 P36897 1/20 0.31
ALOX15 P16050 1/20 0.31
MAPT P10636 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Malic Acid SCHEMBL9188596 0.91 THRB (0.49) SMN1; SMN2THRBTSHRTET2TET3
Malic Acid SCHEMBL261732 0.91 TSHR (0.46) SMN1; SMN2THRBTSHRTET2TET3
Malic Acid SCHEMBL29711798 0.87 THRB (0.54) SMN1; SMN2THRBTSHRTET2TET3
Lactic Acid SCHEMBL3883208 0.83 TSHR (0.50) THRBTSHRPOLBAPEX1HTT
SCHEMBL342263 0.81 THRB (0.50) SMN1; SMN2THRBTSHRPOLBAPEX1
Acetic Acid SCHEMBL2590428 0.80 THRB (0.55) THRBTSHRPOLBAPEX1HTT
SCHEMBL14886 0.80
SCHEMBL29229747 0.80 THRB (0.59) THRBTSHRPOLBAPEX1HTT
SCHEMBL6864388 0.80 THRB (0.59) THRBTSHRPOLBAPEX1HTT
Succinic Acid SCHEMBL891211 0.79 THRB (0.50) THRBTSHRPOLBAPEX1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-102681344-A Photosensitive resin composition, low dielectric constant light shielding layer and liquid crystal display apparatus using the same ROHM & HAAS ELECT MAT 2012-09-19 CN claimed
WO-2023132296-A1 COMPOSITION, METHOD FOR PRODUCING CURED PRODUCT, CURED PRODUCT, COLOR FILTER AND COMPOUND 株式会社ADEKA 2023-07-13 WO disclosed
US-11667730-B2 Oxime ester compound and photopolymerization initiator containing the same ADEKA CORPORATION (JP) 2023-06-06 US disclosed
WO-2022075452-A1 COMPOUND, POLYMERIZATION INITIATOR, POLYMERIZABLE COMPOSITION, CURED PRODUCT, COLOR FILTER AND METHOD FOR PRODUCING CURED PRODUCT 株式会社ADEKA 2022-04-14 WO disclosed
EP-3339331-B1 COMPOSITION ADEKA CORP (JP) 2022-02-16 EP disclosed
CN-106132929-B Oxime ester compound and photopolymerization initiator containing the same 株式会社艾迪科 2020-06-19 CN disclosed
EP-3176153-B1 NOVEL POLYMERIZATION INITIATOR AND RADICALLY POLYMERIZABLE COMPOSITION CONTAINING SAME ADEKA CORP (JP) 2020-04-08 EP disclosed
CN-110007562-A Photopolymerizable unsaturated-resin and photosensitive resin composition containing the photopolymerizable unsaturated-resin 罗门哈斯电子材料韩国有限公司 2019-07-12 CN disclosed
US-10189847-B2 Oxime ester compound and photopolymerization initiator containing said compound ADEKA CORPORATION (JP) 2019-01-29 US disclosed
CN-108369831-A Conductive paste 株式会社艾迪科 2018-08-03 CN disclosed
US-20100015551-A1 NOVEL EPOXY COMPOUND, ALKALI-DEVELOPABLE RESIN COMPOSITION, AND ALKALI-DEVELOPABLE PHOTOSENSITIVE RESIN COMPOSITION ADEKA CORPORATION (JP) 2010-01-21 US disclosed
EP-2145880-A1 NOVEL EPOXY COMPOUND, ALKALI-DEVELOPABLE RESIN COMPOSITION, AND ALKALI-DEVELOPABLE PHOTOSENSITIVE RESIN COMPOSITION Adeka Corporation (JP) 2010-01-20 EP disclosed
EP-2128132-A1 OXIME ESTER COMPOUND AND PHOTOPOLYMERIZATION INITIATOR COMPRISING THE COMPOUND Adeka Corporation (JP) 2009-12-02 EP disclosed
US-20090292039-A1 OXIME ESTER COMPOUND AND PHOTOPOLYMERIZATION INITIATOR CONTAINING THE SAME ADEKA CORPORATION (JP) 2009-11-26 US disclosed
EP-2072500-A1 OXIME ESTER COMPOUND AND PHOTOPOLYMERIZATION INITIATOR CONTAINING THE COMPOUND Adeka Corporation (JP) 2009-06-24 EP disclosed
CN-101107566-A Alkali development type photosensitive coloring composition TOPPAN PRINTING CO LTD (JP) 2008-01-16 CN disclosed
US-20070269720-A1 Alkali-Developable, Colored Photosensitive Resin Composition and Color Filter Using The Alkali-Developable, Colored Photosensitive Resin Composition TOPPAN PRINTING CO., LTD. (JP) 2007-11-22 US disclosed
CN-101044432-A Alkali development-type photosensitive resin composition, substrate with projections for liquid crystal division alignment control formed using the same, and liquid crystal display device TOPPAN PRINTING CO LTD (JP) 2007-09-26 CN disclosed
CN-101006393-A Alkali development-type photosensitive resin composition, substrate with protrusions for liquid crystal split orientational control and color filter formed using the same, and liquid crystal display d TOPPAN PRINTING CO LTD (JP) 2007-07-25 CN disclosed
CN-1989156-A Fluorine-containing copolymer, alkali-developable resin composition, and alkali-developable photosensitive resin composition ADEKA CORP (JP) 2007-06-27 CN disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11667730-B2 Oxime ester compound and photopolymerization initiator containing the same OXER1, CYP4A11, CYP4F11 SMN1; SMN2 3768/4885THRB 402/4885TSHR 344/4885
US-10189847-B2 Oxime ester compound and photopolymerization initiator containing said compound PPOX, CCNO, MRTO4 SMN1; SMN2 1372/4885THRB 2982/4885TSHR 2007/4885
US-20090292039-A1 OXIME ESTER COMPOUND AND PHOTOPOLYMERIZATION INITIATOR CONTAINING THE SAME OXER1, CYP4A11, CYP4F11 SMN1; SMN2 3821/4885THRB 421/4885TSHR 429/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.