SCHEMBL2605534

SCHEMBL2605534

COC(=O)c1ccc(C(=O)Nc2cc(C(C)(C)c3ccc(O)c(NC(=O)c4ccc(C(=O)OC)c(C)c4)c3)ccc2O)cc1C

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 6/20 0.46
ALDH1A1 P00352 5/20 0.46
HPGD P15428 4/20 0.46
MAPT P10636 3/20 0.46
LMNA P02545 2/20 0.46
RAB9A P51151 2/20 0.46
NPY1R P25929 1/20 0.46
NPY2R P49146 1/20 0.46
SMN1; SMN2 Q16637 1/20 0.46
KCNMA1 Q12791 2/20 0.46
KMT2A Q03164 3/20 0.44
POLB P06746 2/20 0.44
ELANE P08246 1/20 0.43
PRTN3 P24158 1/20 0.43
ESRRG P62508 1/20 0.43
MEN1 O00255 2/20 0.43
CYP1A2 P05177 1/20 0.42
CYP2D6 P10635 1/20 0.42
TSHR P16473 1/20 0.42
CYP2C19 P33261 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12937553 0.88 MAPT (0.38) KDM4EALDH1A1HPGDMAPTLMNA
SCHEMBL2605528 0.88 MEN1 (0.52) ALDH1A1MAPTLMNARAB9AKCNMA1
SCHEMBL10001969 0.86 KMT2A (0.52) HPGDMAPTLMNARAB9ASMN1; SMN2
SCHEMBL19846846 0.85 ALDH1A1 (0.44) KDM4EALDH1A1HPGDMAPTLMNA
SCHEMBL19846839 0.82 TDP1 (0.42) ALDH1A1MAPTLMNARAB9AKCNMA1
SCHEMBL2605545 0.82 KCNMA1 (0.62) KDM4EALDH1A1HPGDMAPTRAB9A
SCHEMBL14679673 0.81 NR1H4 (0.48) KDM4EALDH1A1HPGDMAPTLMNA
SCHEMBL2892428 0.81 CFTR (0.50) KDM4EALDH1A1HPGDMAPTLMNA
SCHEMBL25452046 0.81 SERPINE1 (0.48) ALDH1A1MAPTLMNARAB9AKCNMA1
SCHEMBL2605529 0.81 ALDH1A1 (0.48) KDM4EALDH1A1HPGDMAPTLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2555053-B1 POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION TORAY INDUSTRIES (JP) 2017-10-18 EP disclosed
US-8883391-B2 Positive type photosensitive resin composition TORAY INDUSTRIES, INC. (JP) 2014-11-11 US disclosed
US-8158324-B2 Positive-type photosensitive resin composition TORAY INDUSTRIES, INC. (JP) 2012-04-17 US disclosed
US-20100099041-A1 POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION TORAY INDUSTRIES, INC. (JP) 2010-04-22 US disclosed