SCHEMBL26059744

SCHEMBL26059744

O=S(=O)(O)c1ccc(Oc2ccc(I)cc2I)cc1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TAAR5 O14804 1/20 0.39
▸ TAAR1 Q96RJ0 1/20 0.39
▸ LMNA P02545 2/20 0.37
▸ TBXA2R P21731 3/20 0.36
▸ MMP2 P08253 1/20 0.36
▸ MMP9 P14780 1/20 0.36
▸ ALDH1A1 P00352 4/20 0.36
▸ TSHR P16473 4/20 0.36
▸ NT5E P21589 1/20 0.36
▸ HTT P42858 2/20 0.36
▸ SMN1; SMN2 Q16637 2/20 0.36
▸ NPC1 O15118 1/20 0.36
▸ TP53 P04637 1/20 0.36
▸ MAPT P10636 1/20 0.36
▸ XBP1 P17861 1/20 0.36
▸ MAPK1 P28482 1/20 0.36
▸ RAB9A P51151 1/20 0.36
▸ MDM2 Q00987 1/20 0.36
▸ HSD17B10 Q99714 1/20 0.36
▸ KMT2A Q03164 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25564566 0.81 MMP2 (0.50) LMNAMMP2MMP9ALDH1A1TSHR
SCHEMBL9566026 0.80 TAAR5 (0.45) TAAR5TAAR1ALDH1A1HTTSMN1; SMN2
SCHEMBL25564578 0.80 PCNA (0.40) LMNAALDH1A1TSHRNT5EHTT
SCHEMBL9249636 0.74 ALDH1A1 (0.58) LMNAALDH1A1TSHRNT5EHTT
SCHEMBL6914421 0.74 LMNA (0.56) LMNAMMP2MMP9ALDH1A1TSHR
SCHEMBL6090901 0.74 ALDH1A1 (0.58) LMNAALDH1A1TSHRNT5EHTT
SCHEMBL11211364 0.73 EPAS1 (0.44) LMNAALDH1A1TSHRNT5EHTT
SCHEMBL28521152 0.72 ALDH1A1 (0.56) LMNAALDH1A1TSHRNT5EHTT
SCHEMBL34775 0.72 LMNA (0.59) LMNAMMP2MMP9ALDH1A1TSHR
SCHEMBL14599323 0.71 LMNA (0.50) LMNAMMP2MMP9ALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230244142-A1 POLYMER, RESIST COMPOSITION, AND PATTERN FORMING METHOD SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-03 — — US disclosed
US-20230244142-A1 POLYMER, RESIST COMPOSITION, AND PATTERN FORMING METHOD SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-03 — — US disclosed
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