SCHEMBL26059987

SCHEMBL26059987

C=C(C)C(=O)OC(C)c1cc(O)c(O)c(O)c1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KDM4E B2RXH2 3/20 0.39
▸ LMNA P02545 3/20 0.39
▸ TDP1 Q9NUW8 3/20 0.39
▸ FUT7 Q11130 2/20 0.39
▸ POLB P06746 2/20 0.39
▸ GAA P10253 2/20 0.39
▸ L3MBTL1 Q9Y468 2/20 0.39
▸ NFKB1 P19838 1/20 0.39
▸ XDH P47989 1/20 0.39
▸ GFER P55789 1/20 0.39
▸ NFKB2 Q00653 1/20 0.39
▸ RELA Q04206 1/20 0.39
▸ SERPINE1 P05121 7/20 0.37
▸ ALDH1A1 P00352 3/20 0.35
▸ CA12 O43570 2/20 0.35
▸ CA1 P00915 2/20 0.35
▸ CA2 P00918 2/20 0.35
▸ CA7 P43166 2/20 0.35
▸ CA9 Q16790 2/20 0.35
▸ CA14 Q9ULX7 2/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26862030 0.87 PTPN11 (0.35) KDM4ELMNATDP1FUT7POLB
SCHEMBL26861517 0.83 CA12 (0.46) KDM4ELMNATDP1POLBGAA
SCHEMBL26059981 0.83 ADRB1 (0.40) CA12CA1CA2CA7CA9
SCHEMBL18124227 0.81 CA2 (0.42) KDM4ELMNATDP1POLBGAA
SCHEMBL24106321 0.81 CYP3A4 (0.38) LMNAMAPK1SMN1; SMN2TSHRPTGS2
SCHEMBL26794111 0.80 SHBG (0.41) KDM4ELMNAGAACA12CA1
SCHEMBL26816146 0.80 CA12 (0.33) CA12CA1CA2CA7CA9
SCHEMBL14258939 0.80 TSHR (0.41) TDP1POLBALDH1A1CA12CA1
SCHEMBL26861513 0.78 CA12 (0.37) KDM4ETDP1GAACA12CA1
SCHEMBL4660230 0.77 ESR1 (0.42) LMNATDP1ALDH1A1CA12CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230244142-A1 POLYMER, RESIST COMPOSITION, AND PATTERN FORMING METHOD SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-03 — — US disclosed
US-20230244142-A1 POLYMER, RESIST COMPOSITION, AND PATTERN FORMING METHOD SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-03 — — US disclosed
US-9682952-B2 Isotopologues of 3-(5-amino-2-methyl-4-oxoquinazolin-3(4H)-yl) piperidine-2-6-dione and methods of preparation thereof CELGENE CORPORATION (US) 2017-06-20 — — US disclosed
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