SCHEMBL26794111

SCHEMBL26794111

C=C(C)C(=O)OC(C)c1ccc(O)c(F)c1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ SHBG P04278 1/20 0.41
▸ FOLH1 Q04609 1/20 0.39
▸ CA12 O43570 2/20 0.36
▸ CA1 P00915 2/20 0.36
▸ CA2 P00918 2/20 0.36
▸ CA7 P43166 2/20 0.36
▸ CA9 Q16790 2/20 0.36
▸ CA14 Q9ULX7 2/20 0.36
▸ PTGS1 P23219 4/20 0.34
▸ PGR P06401 3/20 0.34
▸ PDE4A P27815 1/20 0.34
▸ NR3C1 P04150 4/20 0.34
▸ AR P10275 2/20 0.34
▸ CYP2C9 P11712 2/20 0.33
▸ CYP2C19 P33261 2/20 0.33
▸ LMNA P02545 2/20 0.33
▸ KDM4E B2RXH2 2/20 0.33
▸ APP P05067 1/20 0.33
▸ CYP3A4 P08684 1/20 0.33
▸ HSD17B10 Q99714 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26059981 0.88 ADRB1 (0.40) SHBGCA12CA1CA2CA7
SCHEMBL26861517 0.86 CA12 (0.46) CA12CA1CA2CA7CA9
SCHEMBL26861513 0.84 CA12 (0.37) CA12CA1CA2CA7CA9
SCHEMBL26862030 0.83 PTPN11 (0.35) PTGS1PGRPDE4ACYP2C9CYP2C19
SCHEMBL26861544 0.83 LMNA (0.44) CYP2C19LMNAAPPPTGS2KMT2A
SCHEMBL24106304 0.82 FOLH1 (0.40) FOLH1CA12CA1CA2CA7
SCHEMBL26793700 0.82 AKR1C3 (0.35) CA12CA1CA2CA7CA9
SCHEMBL24908564 0.82 SHBG (0.38) SHBGFOLH1CA12CA1CA2
SCHEMBL26861530 0.81 TSHR (0.52) CYP3A4MEN1KMT2ATSHRSLC22A6
SCHEMBL14258939 0.81 TSHR (0.41) CA12CA1CA2CA7CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230375925-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, COMPOUND, AND RESIN FUJIFILM CORPORATION (JP) 2023-11-23 — — US disclosed
US-20230367210-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2023-11-16 — — US disclosed
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