SCHEMBL26064906

SCHEMBL26064906

O=C(O)C12CCCC(CC(C3OCC(C(F)(F)F)(C(F)(F)F)O3)C1)C2

nearest known ligand 0.30

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 1/20 0.30
HSD11B2 P80365 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25574064 0.71 HSD11B1 (0.36) HSD11B1HSD11B2
SCHEMBL21722518 0.68 IDH1 (0.35) HSD11B1
SCHEMBL26063090 0.66
SCHEMBL11892793 0.65 CYP1A2 (0.39) HSD11B1
SCHEMBL1374984 0.65 CYP1A2 (0.34) HSD11B1
SCHEMBL10139163 0.63 PKM (0.30)
SCHEMBL22005995 0.63 PKM (0.33) HSD11B1
SCHEMBL4168964 0.62 HSD11B1 (0.36) HSD11B1HSD11B2
SCHEMBL11015180 0.62 ALDH1A1 (0.36) HSD11B1
SCHEMBL16510259 0.62 ALDH1A1 (0.34) HSD11B1HSD11B2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230244142-A1 POLYMER, RESIST COMPOSITION, AND PATTERN FORMING METHOD SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-03 US disclosed
US-20230132653-A1 MOLECULAR RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-04 US disclosed