SCHEMBL26085137

SCHEMBL26085137

CCCC(C)(C)C(=O)OC1(c2ccc(C)cc2)CCCC1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ELANE P08246 1/20 0.40
▸ OPRM1 P35372 1/20 0.36
▸ ADORA3 P0DMS8 1/20 0.35
▸ MEN1 O00255 3/20 0.35
▸ KMT2A Q03164 3/20 0.35
▸ TSHR P16473 1/20 0.35
▸ MAPT P10636 2/20 0.33
▸ SMN1; SMN2 Q16637 2/20 0.33
▸ KDM4E B2RXH2 1/20 0.33
▸ HPGD P15428 1/20 0.33
▸ GAA P10253 1/20 0.33
▸ ALDH1A1 P00352 1/20 0.33
▸ DRD2 P14416 1/20 0.32
▸ DRD4 P21917 1/20 0.32
▸ DRD3 P35462 1/20 0.32
▸ P2RX7 Q99572 1/20 0.32
▸ TDP1 Q9NUW8 2/20 0.31
▸ NPSR1 Q6W5P4 2/20 0.31
▸ ABHD10 Q9NUJ1 1/20 0.31
▸ HTR1E P28566 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19753647 0.89 ADORA3 (0.39) OPRM1ADORA3MEN1KMT2ATSHR
SCHEMBL19753649 0.88 ADORA3 (0.41) OPRM1ADORA3MEN1KMT2ATSHR
SCHEMBL26188242 0.87 ADORA3 (0.36) ELANEOPRM1ADORA3MEN1KMT2A
SCHEMBL26188243 0.86 ADORA3 (0.38) OPRM1ADORA3MEN1KMT2ATSHR
SCHEMBL26085136 0.80 OPRM1 (0.36) OPRM1ADORA3MEN1KMT2ATSHR
SCHEMBL25468013 0.78 ADORA3 (0.39) ELANEOPRM1ADORA3MEN1KMT2A
SCHEMBL25513876 0.77 MAPT (0.33) OPRM1ADORA3MEN1KMT2AMAPT
SCHEMBL24944053 0.77 OPRM1 (0.48) ELANEOPRM1DRD3
SCHEMBL25468010 0.77 ADORA3 (0.39) ADORA3MEN1KMT2ATSHRMAPT
SCHEMBL19753659 0.77 ADORA3 (0.39) OPRM1ADORA3MEN1KMT2ATSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11822244-B2 Compound, resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-11-21 — — US disclosed
US-20230314938-A1 CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-10-05 — — US disclosed
US-20230305391-A1 SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-09-28 — — US disclosed
US-20230305392-A1 SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-09-28 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230305391-A1 SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN RER1, H1-0, BET1 ELANE 1554/4885OPRM1 483/4885ADORA3 3545/4885
US-11822244-B2 Compound, resin, resist composition and method for producing resist pattern RER1, AFF1, AFF4 ELANE 2166/4885OPRM1 131/4885ADORA3 1517/4885
US-20230314938-A1 CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN HCAR1, H1-0, H1-10 ELANE 1441/4885OPRM1 204/4885ADORA3 1677/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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