SCHEMBL2611045

SCHEMBL2611045

CC(C)c1cccc2[nH]nnc12

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GABRA1 P14867 3/20 0.39
TSHR P16473 3/20 0.39
LMNA P02545 2/20 0.39
GABRG2 P18507 2/20 0.39
GABRB3 P28472 2/20 0.39
GABRB2 P47870 2/20 0.39
CYP1A2 P05177 2/20 0.39
CYP3A4 P08684 2/20 0.39
HPGD P15428 2/20 0.39
FAAH O00519 1/20 0.39
CA1 P00915 1/20 0.39
CA2 P00918 1/20 0.39
GABRB1 P18505 1/20 0.39
PTGS1 P23219 1/20 0.39
SLC6A2 P23975 1/20 0.39
HTR2C P28335 1/20 0.39
GABRA5 P31644 1/20 0.39
GABRA3 P34903 1/20 0.39
HTR2B P41595 1/20 0.39
GABRA2 P47869 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Bicarbonate SCHEMBL2854209 0.92 LMNA (0.37) GABRA1TSHRLMNAGABRG2GABRB3
SCHEMBL11151068 0.89 CYP1A2 (0.30) GABRA1TSHRLMNAGABRG2GABRB3
SCHEMBL5381799 0.85 KDM4E (0.37) GABRA1TSHRLMNAGABRG2GABRB3
SCHEMBL8208195 0.85 P2RX7 (0.34)
SCHEMBL7048243 0.82 IDO1 (0.31) GABRA1TSHRLMNAGABRG2GABRB3
SCHEMBL9222918 0.82 TSHR (0.42) TSHRTAAR1
SCHEMBL2721766 0.81
SCHEMBL31182065 0.81
SCHEMBL9952180 0.78 GABRA1 (0.41) GABRA1TSHRLMNAGABRG2GABRB3
SCHEMBL6846649 0.78 IDO1 (0.36) TSHRLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 330 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3774680-B1 CLEANING COMPOSITIONS FUJIFILM ELECTRONIC MAT USA INC (US) 2025-09-24 EP claimed
US-12187984-B2 Treatment liquid and method for treating object to be treated FUJIFILM CORPORATION (JP) 2025-01-07 US claimed
US-12139693-B2 Treatment liquid and method for treating object to be treated FUJIFILM CORPORATION (JP) 2024-11-12 US claimed
EP-3672944-B1 CLEANING COMPOSITIONS FUJIFILM ELECTRONIC MAT USA INC (US) 2024-08-07 EP claimed
US-20240174924-A1 ETCHING COMPOSITIONS FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2024-05-30 US claimed
CN-114364779-B Treatment liquid and method for treating object to be treated 富士胶片株式会社 2024-05-28 CN claimed
EP-3719105-B1 CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MAT USA INC (US) 2023-09-27 EP claimed
CN-110997643-B Cleaning composition 富士胶片电子材料美国有限公司 2023-06-06 CN claimed
US-20230159864-A1 TREATMENT LIQUID AND METHOD FOR TREATING OBJECT TO BE TREATED FUJIFILM CORPORATION (JP) 2023-05-25 US claimed
CN-111902379-B Cleaning composition 富士胶片电子材料美国有限公司 2023-02-17 CN claimed
EP-3060642-A1 CLEANING FORMULATIONS FOR REMOVING RESIDUES ON SURFACES FujiFilm Electronic Materials USA, Inc. (US) 2016-08-31 EP claimed
CN-105849245-A Cleaning formulations for removing residues on surfaces 富士胶片电子材料美国有限公司 2016-08-10 CN claimed
US-20150267112-A1 Etching Composition FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2015-09-24 US claimed
WO-2015142778-A1 ETCHING COMPOSITION FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2015-09-24 WO claimed
WO-2015089023-A1 CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2015-06-18 WO claimed
US-20150159125-A1 CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2015-06-11 US claimed
US-20150159124-A1 CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2015-06-11 US claimed
WO-2015084921-A1 CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2015-06-11 WO claimed
WO-2015060954-A1 CLEANING FORMULATIONS FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2015-04-30 WO claimed
US-20150111804-A1 CLEANING FORMULATIONS FOR REMOVING RESIDUES ON SURFACES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. 2015-04-23 US claimed