⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9976298 | 0.88 | — | — | |
| SCHEMBL9972950 | 0.87 | — | — | |
| SCHEMBL10305689 | 0.83 | — | — | |
| SCHEMBL13695152 | 0.82 | — | — | |
| SCHEMBL13897162 | 0.79 | — | — | |
| SCHEMBL11657144 | 0.78 | ALDH1A1 (0.33) | — | |
| SCHEMBL19760060 | 0.78 | LMNA (0.31) | — | |
| SCHEMBL6754694 | 0.78 | LMNA (0.31) | — | |
| SCHEMBL9643843 | 0.77 | — | — | |
| SCHEMBL11926226 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 197 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-3963668-A | GLASS FIBERS, ALKOXYMETHYL UREAS | BASF AKTIENGESELLSCHAFT (DT) | 1976-06-15 | — | — | US | claimed |
| CN-118652322-A | High-strength recombinant collagen, high-strength collagen engineering material and preparation method thereof | 医图生科(苏州)生命科学技术有限公司 | 2024-09-17 | — | — | CN | disclosed |
| WO-2024002149-A1 | RECOMBINANT TYPE-III COLLAGEN AND METHOD FOR PREPARING SAME | 华熙生物科技股份有限公司 | 2024-01-04 | — | — | WO | disclosed |
| US-20230152699-A1 | FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2023-05-18 | — | — | US | disclosed |
| US-20230152699-A1 | FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2023-05-18 | — | — | US | disclosed |
| US-11572430-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-02-07 | — | — | US | disclosed |
| CN-114805551-B | Recombinant type III collagen and preparation method thereof | 华熙生物科技股份有限公司 | 2022-09-13 | — | — | CN | disclosed |
| CN-114805551-A | Recombinant type III collagen and preparation method thereof | 华熙生物科技股份有限公司 | 2022-07-29 | — | — | CN | disclosed |
| US-11243467-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2022-02-08 | — | — | US | disclosed |
| EP-3062151-B1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR USE IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM | MITSUBISHI GAS CHEMICAL CO (JP) | 2021-05-05 | — | — | EP | disclosed |
| US-20070141510-A1 | NANOCOMPOSITE PHOTOSENSITIVE COMPOSITION AND USE THEREOF | CHEN CHUNWEI | 2007-06-21 | — | — | US | disclosed |
| US-20070020557-A1 | New organic bottom antireflective polymer compositions | AZ ELECTRONIC MATERIALS USA CORP. | 2007-01-25 | — | — | US | disclosed |
| US-20070020557-A1 | New organic bottom antireflective polymer compositions | AZ ELECTRONIC MATERIALS USA CORP. | 2007-01-25 | — | — | US | disclosed |
| WO-2007010385-A1 | NEW ORGANIC BOTTOM ANTIREFLECTIVE POLYMER COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2007-01-25 | — | — | WO | disclosed |
| US-7160665-B2 | Method for employing vertical acid transport for lithographic imaging applications | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-01-09 | — | — | US | disclosed |
| US-7160665-B2 | Method for employing vertical acid transport for lithographic imaging applications | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-01-09 | — | — | US | disclosed |
| US-4081386-A | ANTIOXIDANTS | THE LUBRIZOL CORPORATION (US) | 1978-03-28 | — | — | US | disclosed |
| US-4079030-A | Pressure sensitive adhesive acrylic ester polymer compositions employing at least one derivative of a tetrahydro-4H-1,3,5-oxadiazine-4-one as a cross-linking agent | SALVE S. A. (CH) | 1978-03-14 | — | — | US | disclosed |
| US-3996220-A | Production of 4-oxotetrahydro-1,3,5-oxadiazines | BADISCHE ANILIN- & SODA-FABRIK AKTIENGESELLSCHAFT (DT) | 1976-12-07 | — | — | US | disclosed |
| US-3963668-A | GLASS FIBERS, ALKOXYMETHYL UREAS | BASF AKTIENGESELLSCHAFT (DT) | 1976-06-15 | — | — | US | disclosed |