Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2616354 | 0.90 | PIK3CD (0.33) | — | |
| SCHEMBL11647312 | 0.89 | LMNA (0.30) | LMNA | |
| SCHEMBL9972952 | 0.85 | KMT2A (0.36) | LMNA | |
| SCHEMBL3758620 | 0.84 | — | — | |
| SCHEMBL27525130 | 0.84 | PER2 (0.33) | — | |
| SCHEMBL19760060 | 0.84 | LMNA (0.31) | LMNA | |
| SCHEMBL11839585 | 0.80 | BCHE (0.31) | — | |
| SCHEMBL13292260 | 0.80 | BRD4 (0.37) | — | |
| SCHEMBL11826595 | 0.80 | — | — | |
| SCHEMBL13241902 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 119 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-3963668-A | GLASS FIBERS, ALKOXYMETHYL UREAS | BASF AKTIENGESELLSCHAFT (DT) | 1976-06-15 | — | — | US | claimed |
| CN-122029216-A | Polyhydroxy amide compound, negative photosensitive resin composition, dry film, cured product, and electronic component | 太阳控股株式会社 | 2026-05-12 | — | — | CN | disclosed |
| CN-119032325-A | Negative photosensitive resin composition, dry film, cured product, and electronic component | 太阳控股株式会社 | 2024-11-26 | — | — | CN | disclosed |
| CN-117866195-A | High refractive index material | 罗门哈斯电子材料有限责任公司 | 2024-04-12 | — | — | CN | disclosed |
| US-20240092976-A1 | CONDENSATION-CURABLE SILICONE COMPOSITION, A CURED PRODUCT, AND A METHOD FOR PREPARING THE CURED PRODUCT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-03-21 | — | — | US | disclosed |
| EP-4286480-A1 | CONDENSATION-CURABLE SILICONE COMPOSITION, CURED PRODUCT, AND METHOD FOR MANUFACTURING SAID CURED PRODUCT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-06 | — | — | EP | disclosed |
| US-20230152699-A1 | FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2023-05-18 | — | — | US | disclosed |
| US-20230152699-A1 | FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2023-05-18 | — | — | US | disclosed |
| US-11572430-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-02-07 | — | — | US | disclosed |
| WO-2022163515-A1 | CONDENSATION-CURABLE SILICONE COMPOSITION, CURED PRODUCT, AND METHOD FOR MANUFACTURING SAID CURED PRODUCT | 信越化学工業株式会社 | 2022-08-04 | — | — | WO | disclosed |
| US-20020016431-A1 | Monomer having diol structure, polymer thereof, and negative photoresist composition and pattern forming method using the same background of the invention | NEC CORPORATION | 2002-02-07 | — | — | US | disclosed |
| US-20010018161-A1 | Photosensitive resin for photolithography | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-08-30 | — | — | US | disclosed |
| US-6146806-A | Negative photoresist composition using polymer having 1,2-diol structure and process for forming pattern using the same | NEC CORPORATION (JP) | 2000-11-14 | — | — | US | disclosed |
| US-6103898-A | REACTING ACYCLIC UREA DERIVATIVE WITH A DIKETONE, SUBSEQUENT CATALYTIC HYDROGENATION TO FORM CYCLIZED POLAR APROTIC SOLVENT | BASF AKTIENGESELLSCHAFT (DE) | 2000-08-15 | — | — | US | disclosed |
| US-6074801-A | POLYMER WITH REPEATING UNITS, CROSSLINKING AND ADDING PHOTOACID GENERATOR WITH LIGHT | NEC CORPORATION (JP) | 2000-06-13 | — | — | US | disclosed |
| US-6030747-A | CHEMICALLY AMPLIFIED RESIST CONSISTS OF A PHOTOACID GENERATOR, A CROSSLINKING AGENT ACTIVATED IN PRESENCE OF ACID AND A COPOLYMER OF ACRYLIC OR METHACRYLIC ESTER CONTAINING AN ACID, HYDROXY OR ESTER POLAR GROUP AND A COMPOUND | NEC CORPORATION (JP) | 2000-02-29 | — | — | US | disclosed |
| EP-0906905-A1 | Process for the preparation of cyclic ureas | BASF AKTIENGESELLSCHAFT (DE) | 1999-04-07 | — | — | EP | disclosed |
| US-4115364-A | MELT SPINNING WITH A THERMOPLASTIC NYLON, CURING, REACTING WITH UREA COMPOUND | NIPPON KYNOL INCORPORATED (JP) | 1978-09-19 | — | — | US | disclosed |
| US-4044006-A | FLAME RESISTANCE | STAUFFER CHEMICAL COMPANY (US) | 1977-08-23 | — | — | US | disclosed |
| US-3963668-A | GLASS FIBERS, ALKOXYMETHYL UREAS | BASF AKTIENGESELLSCHAFT (DT) | 1976-06-15 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11572430-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | C9, C5, C1R | LMNA 723/4885ATM 888/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.