SCHEMBL2616752

SCHEMBL2616752

CCO[Si](C)(CCCNC(=O)CCC(=O)O)OCC

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 3/20 0.40
CASP2 P42575 1/20 0.40
TSHR P16473 1/20 0.39
MEN1 O00255 2/20 0.38
KMT2A Q03164 2/20 0.38
MAPT P10636 1/20 0.38
SLC6A5 Q9Y345 1/20 0.38
PHF8 Q9UPP1 1/20 0.38
KDM2A Q9Y2K7 1/20 0.38
KDM4E B2RXH2 1/20 0.38
HTT P42858 1/20 0.38
NAAA Q02083 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.37
FAAH O00519 2/20 0.36
CNR1 P21554 2/20 0.36
CNR2 P34972 2/20 0.36
HDAC3 O15379 1/20 0.36
HDAC4 P56524 1/20 0.36
HDAC1 Q13547 1/20 0.36
HDAC7 Q8WUI4 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24843462 0.92 EPHX2 (0.46) EPHX2CASP2TSHRMEN1KMT2A
SCHEMBL24843701 0.91 EPHX2 (0.51) EPHX2CASP2TSHRMEN1KMT2A
SCHEMBL23289097 0.87 EPHX2 (0.40) EPHX2CASP2TSHRMEN1KMT2A
SCHEMBL2616692 0.85 EPHX2 (0.41) EPHX2CASP2TSHRMEN1KMT2A
SCHEMBL960960 0.84 NAAA (0.45) CASP2TSHRMEN1KMT2ANAAA
SCHEMBL2616753 0.83 TSHR (0.44) EPHX2CASP2TSHRMEN1KMT2A
SCHEMBL28517185 0.83 FAAH (0.57) EPHX2CASP2SLC6A5KDM4ENAAA
SCHEMBL11905619 0.82 PLA2G2A (0.36) TSHRFAAHCNR1CNR2ADRA1A
SCHEMBL17578483 0.82 TSHR (0.40) EPHX2CASP2TSHRMEN1KMT2A
SCHEMBL16422222 0.81 MEN1 (0.41) CASP2TSHRMEN1KMT2ANAAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230002562-A1 POLYSILOXANE COPOLYMER, METHOD FOR PREPARING THE SAME AND RESIN COMPOSITION INCLUDING THE SAME HUNETPLUS CO., LTD. (KR) 2023-01-05 US disclosed
WO-2021080267-A1 POLYSILOXANE COPOLYMER, METHOD FOR PRODUCING SAME, AND RESIN COMPOSITION COMPRISING SAME (주)휴넷플러스 2021-04-29 WO disclosed
US-8492071-B2 Curable composition, color filter and process for production thereof, and solid-state imaging device FUJIFILM CORPORATION (JP) 2013-07-23 US disclosed
US-8492071-B2 Curable composition, color filter and process for production thereof, and solid-state imaging device FUJIFILM CORPORATION (JP) 2013-07-23 US disclosed
US-8158307-B2 Forming first color pattern in repeating pattern on substrate; forming second color pattern on substrate; removal by dry etching; forming third color pattern FUJIFILM CORPORATION (JP) 2012-04-17 US disclosed
US-20110028587-A1 CURABLE COMPOSITION, COLOR FILTER AND PROCESS FOR PRODUCTION THEREOF, AND SOLID-STATE IMAGING DEVICE FUJIFILM CORPORATION (JP) 2011-02-03 US disclosed
US-20110028587-A1 CURABLE COMPOSITION, COLOR FILTER AND PROCESS FOR PRODUCTION THEREOF, AND SOLID-STATE IMAGING DEVICE FUJIFILM CORPORATION (JP) 2011-02-03 US disclosed
US-20080206659-A1 COLOR FILTER AND METHOD OF MANUFACTURING THE SAME, AND SOLID-STATE IMAGE PICKUP ELEMENT FUJIFILM CORPORATION (JP) 2008-08-28 US disclosed