Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTT | P42858 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.33 |
| ▸ | TP53 | P04637 | 2/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.31 |
| ▸ | HPGD | P15428 | 2/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.31 |
| ▸ | RAB9A | P51151 | 2/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 2/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12430567 | 0.93 | HTT (0.31) | HTTALDH1A1SMN1; SMN2KDM4EHPGD | |
| SCHEMBL2736002 | 0.93 | CRHR1 (0.33) | HTTALDH1A1SMN1; SMN2 | |
| SCHEMBL16556335 | 0.93 | SMN1; SMN2 (0.33) | HTTSMN1; SMN2 | |
| SCHEMBL13936626 | 0.92 | HTT (0.30) | HTT | |
| SCHEMBL12216063 | 0.92 | HTT (0.30) | HTTSMN1; SMN2 | |
| SCHEMBL2736006 | 0.90 | TP53 (0.33) | TP53 | |
| SCHEMBL13133046 | 0.84 | TAS2R14 (0.31) | — | |
| SCHEMBL2736011 | 0.84 | ALDH1A1 (0.41) | ALDH1A1SMN1; SMN2TP53KDM4EHPGD | |
| SCHEMBL13133044 | 0.83 | LDHA (0.35) | — | |
| SCHEMBL13133037 | 0.83 | MEN1 (0.32) | ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8877969-B2 | Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition | FUJIFILM CORPORATION (JP) | 2014-11-04 | — | — | US | disclosed |
| US-8765218-B2 | Process for making core-shell fluorinated particles and an overcoat layer comprising the same | XEROX CORPORATION (US) | 2014-07-01 | — | — | US | disclosed |
| US-8655220-B2 | Electrophotographic photoreceptor, process cartridge and image forming apparatus | FUJI XEROX CO., LTD. (JP) | 2014-02-18 | — | — | US | disclosed |
| US-8535861-B2 | Image forming apparatus and process cartridge | FUJI XEROX CO., LTD. (JP) | 2013-09-17 | — | — | US | disclosed |
| US-8437663-B2 | Charging member, process cartridge and image forming apparatus | FUJI XEROX CO., LTD. (JP) | 2013-05-07 | — | — | US | disclosed |
| US-8426101-B2 | Photosensitive composition, pattern-forming method using the photosensitve composition and compound in the photosensitive composition | FUJIFILM CORPORATION (JP) | 2013-04-23 | — | — | US | disclosed |
| US-8404427-B2 | Photosensitive composition, and pattern-forming method and resist film using the photosensitive composition | FUJIFILM CORPORATION (JP) | 2013-03-26 | — | — | US | disclosed |
| US-8211558-B2 | Crosslinked polymer electrolyte and method for producing same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-07-03 | — | — | US | disclosed |
| US-8206886-B2 | Photosensitive composition and pattern-forming method using the photosensitive composition | FUJIFILM CORPORATION (JP) | 2012-06-26 | — | — | US | disclosed |
| US-8158326-B2 | Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition | FUJIFILM CORPORATION (JP) | 2012-04-17 | — | — | US | disclosed |
| US-7323286-B2 | Photosensitive composition, compound used in the same, and patterning method using the same | FUJIFILM CORPORATION (JP) | 2008-01-29 | — | — | US | disclosed |
| US-20070212645-A1 | Photo sensitive composition, pattern-forming method using the photosensitive composition and compound for use in the photosensitive composition | FUJIFILM CORPORATION (JP) | 2007-09-13 | — | — | US | disclosed |
| US-20070196766-A1 | Photosensitive composition, pattern-forming method using the photosensitive composition and compounds used in the photosensitive composition | FUJIFILM CORPORATION (JP) | 2007-08-23 | — | — | US | disclosed |
| US-20070184384-A1 | Novel sulfonium compound, photosensitive composition containing the compound and pattern-forming method using the photosensitive composition | FUJIFILM CORPORATION (JP) | 2007-08-09 | — | — | US | disclosed |
| US-7250480-B2 | Acrylic composition and a curable coating composition including the same | BASF CORPORATION (US) | 2007-07-31 | — | — | US | disclosed |
| US-20070148592-A1 | Photosensitive composition, pattern-forming method using the photosensitive composition and compounds used in the photosensitive composition | FUJIFILM CORPORATION (JP) | 2007-06-28 | — | — | US | disclosed |
| US-20070141512-A1 | Photosensitive composition, pattern-forming method using the photosensitve composition and compound in the photosensitive composition | FUJIFILM CORPORATION (JP) | 2007-06-21 | — | — | US | disclosed |
| US-7226971-B2 | Polyester resin with carbamate functionality, a method of preparing the resin, and a coating composition utilizing the resin | BASF CORPORATION (US) | 2007-06-05 | — | — | US | disclosed |
| US-20070082289-A1 | Photosensitive composition, pattern forming method using the photosensitive composition and compound for use in the photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2007-04-12 | — | — | US | disclosed |
| US-7189492-B2 | Photosensitive composition and pattern forming method using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2007-03-13 | — | — | US | disclosed |