SCHEMBL2620574

SCHEMBL2620574

COc1ccc(C2CCC(C(C)(C)C3CCC(c4ccc(CO)cc4)C(c4ccc(CO)cc4)C3)CC2c2ccc(OC)cc2)cc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ HTR2C P28335 1/20 0.43
▸ KDM1A O60341 6/20 0.42
▸ MAOA P21397 4/20 0.42
▸ MAOB P27338 3/20 0.42
▸ KDM4E B2RXH2 1/20 0.39
▸ MAPT P10636 1/20 0.39
▸ ALDH1A1 P00352 1/20 0.37
▸ TUBB4A P04350 1/20 0.37
▸ TUBB P07437 1/20 0.37
▸ TUBA3C P0DPH7 1/20 0.37
▸ TUBA1B P68363 1/20 0.37
▸ TUBA4A P68366 1/20 0.37
▸ TUBB4B P68371 1/20 0.37
▸ TUBB3 Q13509 1/20 0.37
▸ TUBB2A Q13885 1/20 0.37
▸ TUBB8 Q3ZCM7 1/20 0.37
▸ TUBA3E Q6PEY2 1/20 0.37
▸ TUBA1A Q71U36 1/20 0.37
▸ TUBA1C Q9BQE3 1/20 0.37
▸ TUBB6 Q9BUF5 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12360680 0.82 DRD2 (0.43) HTR2CKDM4EMAPTALDH1A1PPARG
SCHEMBL13609953 0.74 KDM1A (0.42) KDM1A
SCHEMBL2620558 0.72 SLC6A4 (0.37) ALDH1A1PPARGPPARARAB9A
SCHEMBL8089502 0.71 MAPT (0.44) MAOBMAPTALDH1A1
SCHEMBL14616469 0.71 ABL1 (0.39) HTR2CMAOBMAPT
SCHEMBL4181089 0.71 IDO1 (0.58) ALDH1A1CALM1
SCHEMBL27329 0.71 IDO1 (0.58) ALDH1A1CALM1
SCHEMBL2958835 0.69 KDM4E (0.43) KDM4EMAPTALDH1A1CALM1
SCHEMBL11064728 0.69 KDM1A (0.72) HTR2CKDM1AMAOAMAOBMAPT
SCHEMBL11064726 0.69 KDM1A (0.72) HTR2CKDM1AMAOAMAOBMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9005876-B2 Positive photosensitive resin composition for spray coating and method for producing through electrode using the same SUMITOMO BAKELITE CO., LTD. (JP) 2015-04-14 — — US disclosed
US-20140113448-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION FOR SPRAY COATING AND METHOD FOR PRODUCING THROUGH ELECTRODE USING THE SAME SUMITOMO BAKELITE CO., LTD. (JP) 2014-04-24 — — US disclosed
US-20130280654-A1 POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, PROTECTIVE FILM, INSULATING FILM, AND SEMICONDUCTOR DEVICE AND DISPLAY DEVICE INCLUDING THE CURED FILM SUMITOMO BAKELITE CO (JP) 2013-10-24 — — US disclosed
US-8530119-B2 Positive photosensitive resin composition, cured film, protective film, interlayer insulating film, and semiconductor device and display element using the same SUMITOMO BAKELITE CO., LTD. (JP) 2013-09-10 — — US disclosed
US-8492469-B2 Positive-type photosensitive resin composition, cured film, protective film, insulating film, and semiconductor device and display device including the cured film SUMITOMO BAKELITE CO., LTD. (JP) 2013-07-23 — — US disclosed
US-20130108967-A1 METHOD FOR FORMING CURED FILM SUMITOMO BAKELITE CO., LTD. (JP) 2013-05-02 — — US disclosed
US-20120100484-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, PROTECTIVE FILM, INTERLAYER INSULATING FILM, AND SEMICONDUCTOR DEVICE AND DISPLAY ELEMENT USING THE SAME SUMITOMO BAKELITE CO., LTD. (JP) 2012-04-26 — — US disclosed
US-20110200937-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION FOR SPRAY COATING AND METHOD FOR PRODUCING THROUGH ELECTRODE USING THE SAME SUMITOMO BAKELITE CO., LTD. (JP) 2011-08-18 — — US disclosed
US-20110136952-A1 POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, PROTECTIVE FILM, INSULATING FILM, AND SEMICONDUCTOR DEVICE AND DISPLAY DEVICE INCLUDING THE CURED FILM SUMITOMO BAKELITE CO., LTD. (JP) 2011-06-09 — — US disclosed
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