SCHEMBL26206436

SCHEMBL26206436

CCOC(C)OC(=O)c1cc(I)ccc1Oc1c(F)c(F)c(S(=O)(=O)O)c(F)c1F

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
▸ S1PR3 Q99500 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26206441 0.76 — —
SCHEMBL10760547 0.75 PTGS2 (0.35) —
SCHEMBL16683134 0.74 ALDH1A1 (0.36) —
SCHEMBL26206450 0.74 CA12 (0.36) —
SCHEMBL26206593 0.70 CA1 (0.34) —
SCHEMBL26206428 0.69 L3MBTL1 (0.38) —
SCHEMBL16683026 0.68 PTGS2 (0.37) —
SCHEMBL15189409 0.67 KDM4E (0.35) —
SCHEMBL8419945 0.65 CA12 (0.33) —
SCHEMBL8419951 0.64 BRPF1 (0.40) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023162565-A1 ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND ELECTRONIC DEVICE MANUFACTURING METHOD 富士フイルム株式会社 2023-08-31 — — WO disclosed
Send feedback