SCHEMBL26208554

SCHEMBL26208554

CC(C)=Nc1cccc(C#Cc2ccccc2)c1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
APP P05067 1/20 0.44
NOS1 P29475 7/20 0.44
NOS3 P29474 2/20 0.41
KCNH2 Q12809 1/20 0.40
PTPN11 Q06124 1/20 0.40
CA12 O43570 1/20 0.40
CA1 P00915 1/20 0.40
CA2 P00918 1/20 0.40
CA9 Q16790 1/20 0.40
HNF4A P41235 1/20 0.39
PTGES O14684 1/20 0.38
CRHR1 P34998 2/20 0.37
NPC1 O15118 2/20 0.37
RAB9A P51151 2/20 0.37
SMN1; SMN2 Q16637 2/20 0.37
KDM4E B2RXH2 1/20 0.37
MEN1 O00255 1/20 0.37
ALDH1A1 P00352 1/20 0.37
TP53 P04637 1/20 0.37
CYP1A2 P05177 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26208548 0.85 NOS1 (0.44) NOS1CRHR1CYP1A2NOS2
SCHEMBL26208553 0.82 APP (0.50) APPNOS1NOS3KCNH2CA12
SCHEMBL26208561 0.79 CRHR1 (0.50) NOS1CA12CA1CA2CA9
SCHEMBL714543 0.77 NOS1 (0.68) NOS1NOS3NOS2
SCHEMBL486925 0.75 NOS1 (0.67) NOS1NOS3CRHR1RAB9ASMN1; SMN2
SCHEMBL6364777 0.72 APP (0.75) APPKCNH2PTPN11CA12CA1
SCHEMBL21241357 0.70 HTR3E (0.67) NOS1CRHR1NPC1RAB9ASMN1; SMN2
Diphenylacetylene SCHEMBL27628902 0.69 APP (0.92) APPKCNH2CA12CA1CA2
SCHEMBL14269525 0.68 HTR3E (0.64) NOS1NOS3CRHR1MEN1ALDH1A1
SCHEMBL12182347 0.68 ACACB (0.57) APPPTPN11CA12CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230280655-A1 COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-07 US disclosed
US-20230280655-A1 COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-07 US disclosed