SCHEMBL26249010

SCHEMBL26249010

CCc1cc(C)cc(Cc2cc(C)cc(CO)c2O)c1O

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
AMY1A P0DUB6 1/20 0.53
CYP2C9 P11712 3/20 0.52
CYP2C19 P33261 2/20 0.52
HIF1A Q16665 2/20 0.52
SMN1; SMN2 Q16637 1/20 0.52
HSPA5 P11021 2/20 0.48
SHBG P04278 1/20 0.46
CYP2D6 P10635 1/20 0.42
HSD17B10 Q99714 1/20 0.42
GABRA1 P14867 1/20 0.40
GABRB2 P47870 1/20 0.40
KDM4E B2RXH2 1/20 0.38
CASP6 P55212 1/20 0.38
CYP1A2 P05177 1/20 0.36
CYP3A4 P08684 1/20 0.36
DHFR P00374 1/20 0.35
SELL P14151 1/20 0.34
SELP P16109 1/20 0.34
SELE P16581 1/20 0.34
ALOX15 P16050 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15080879 0.94 SHBG (0.45) AMY1ACYP2C9CYP2C19HIF1ASMN1; SMN2
SCHEMBL1482608 0.92 AMY1A (0.61) AMY1ACYP2C9CYP2C19HIF1ASMN1; SMN2
SCHEMBL12430315 0.92 AMY1A (0.61) AMY1ACYP2C9CYP2C19HIF1ASMN1; SMN2
SCHEMBL29400422 0.92 AMY1A (0.61) AMY1ACYP2C9CYP2C19HIF1ASMN1; SMN2
SCHEMBL210506 0.92 AMY1A (0.61) AMY1ACYP2C9CYP2C19HIF1ASMN1; SMN2
SCHEMBL187792 0.85 SHBG (0.52) AMY1ACYP2C9CYP2C19HIF1ASMN1; SMN2
SCHEMBL45859 0.85 GABRA1 (0.52) AMY1ACYP2C9CYP2C19HIF1ASMN1; SMN2
SCHEMBL14997932 0.85 AMY1A (0.50) AMY1ACYP2C9CYP2C19HIF1ASMN1; SMN2
SCHEMBL14606502 0.84 AMY1A (0.53) AMY1ACYP2C9CYP2C19HIF1ASMN1; SMN2
SCHEMBL18287641 0.84 AMY1A (0.58) AMY1ACYP2C9CYP2C19HIF1ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11768436-B2 Protective film forming composition having a diol structure NISSAN CHEMICAL CORPORATION (JP) 2023-09-26 US disclosed
US-20230296982-A1 POLYMER, COMPOSITION, METHOD FOR PRODUCING POLYMER, COMPOSITION, COMPOSITION FOR FILM FORMATION, RESIST COMPOSITION, RADIATION-SENSITIVE COMPOSITION, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, RESIST PATTERN FORMATION METHOD, METHOD FOR PRODUCING UNDERLAYER FILM FOR LITHOGRAPHY, CIRCUIT PATTERN FORMATION METHOD, AND COMPOSITION FOR OPTICAL MEMBER FORMATION MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2023-09-21 US disclosed