⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12043851 | 0.79 | NR1H2 (0.30) | — | |
| SCHEMBL9979403 | 0.77 | ALDH1A1 (0.30) | — | |
| SCHEMBL11990044 | 0.75 | AR (0.32) | — | |
| SCHEMBL15134123 | 0.75 | ALDH1A1 (0.37) | — | |
| SCHEMBL85653 | 0.74 | NR1H2 (0.36) | — | |
| SCHEMBL24463793 | 0.73 | CES2 (0.41) | — | |
| SCHEMBL13917505 | 0.73 | — | — | |
| SCHEMBL20642225 | 0.72 | TSHR (0.32) | — | |
| SCHEMBL22623957 | 0.72 | TSHR (0.32) | — | |
| SCHEMBL22623997 | 0.72 | CES2 (0.40) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20130009323-A1 | INTERCONNECT STRUCTURE AND METHOD OF FABRICATING | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-01-10 | — | — | US | disclosed |
| US-8334203-B2 | Interconnect structure and method of fabricating | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-12-18 | — | — | US | disclosed |
| US-20120301980-A1 | METHODOLOGY FOR EVALUATION OF ELECTRICAL CHARACTERISTICS OF CARBON NANOTUBES | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-11-29 | — | — | US | disclosed |
| US-20120231622-A1 | SELF-ALIGNED DUAL DAMASCENE BEOL STRUCTURES WITH PATTERNABLE LOW- K MATERIAL AND METHODS OF FORMING SAME | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-09-13 | — | — | US | disclosed |
| US-20120161296-A1 | MULTIPLE PATTERNING USING IMPROVED PATTERNABLE LOW-k DIELECTRIC MATERIALS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-06-28 | — | — | US | disclosed |
| US-8202783-B2 | Patternable low-k dielectric interconnect structure with a graded cap layer and method of fabrication | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-06-19 | — | — | US | disclosed |
| US-8163658-B2 | Multiple patterning using improved patternable low-k dielectric materials | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-04-24 | — | — | US | disclosed |
| US-20110309507-A1 | METHODOLOGY FOR EVALUATION OF ELECTRICAL CHARACTERISTICS OF CARBON NANOTUBES | INTERNATIONAL BUSINESS MACHINES CORP. (US) | 2011-12-22 | — | — | US | disclosed |
| US-20110304053-A1 | INTERCONNECT STRUCTURE AND METHOD OF FABRICATING | INTERNATIONAL BUSINESS MACHINES CORP. (US) | 2011-12-15 | — | — | US | disclosed |
| US-7919225-B2 | Photopatternable dielectric materials for BEOL applications and methods for use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-04-05 | — | — | US | disclosed |
| US-20110074044-A1 | PATTERNABLE LOW-K DIELECTRIC INTERCONNECT STRUCTURE WITH A GRADED CAP LAYER AND METHOD OF FABRICATION | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-03-31 | — | — | US | disclosed |
| US-20110042790-A1 | MULTIPLE PATTERNING USING IMPROVED PATTERNABLE LOW-k DIELECTRIC MATERIALS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-02-24 | — | — | US | disclosed |
| US-20100314767-A1 | SELF-ALIGNED DUAL DAMASCENE BEOL STRUCTURES WITH PATTERNABLE LOW- K MATERIAL AND METHODS OF FORMING SAME | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-12-16 | — | — | US | disclosed |
| US-20090291389-A1 | PHOTOPATTERNABLE DIELECTRIC MATERIALS FOR BEOL APPLICATIONS AND METHODS FOR USE | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-11-26 | — | — | US | disclosed |