SCHEMBL26312618

SCHEMBL26312618

C=COCCOc1ccc(C(c2ccc(OCCOC=C)cc2)C(c2ccc(OCCOC=C)cc2)c2ccc(OCCOC=C)cc2)cc1

nearest known ligand 0.44

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
HRH3 Q9Y5N1 2/20 0.40
THRB P10828 1/20 0.35
SLC2A1 P11166 3/20 0.35
L3MBTL1 Q9Y468 2/20 0.34
ALDH1A1 P00352 1/20 0.34
POLB P06746 1/20 0.34
TDP1 Q9NUW8 1/20 0.34
CHRNB2 P17787 1/20 0.34
CHRNB4 P30926 1/20 0.34
CHRNA3 P32297 1/20 0.34
CHRNA7 P36544 1/20 0.34
CHRNA4 P43681 1/20 0.34
PRSS1 P07477 2/20 0.33
PSMB1 P20618 1/20 0.33
PSMB5 P28074 1/20 0.33
MEN1 O00255 1/20 0.33
KMT2A Q03164 1/20 0.33
PKM P14618 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26312614 0.89 HRH3 (0.37) HRH3THRBSLC2A1L3MBTL1ALDH1A1
SCHEMBL419937 0.88 THRB (0.41) THRBL3MBTL1ALDH1A1TDP1CHRNB2
SCHEMBL21610572 0.85 KMT2A (0.47) POLBTDP1PSMB1PSMB5MEN1
SCHEMBL13888317 0.82 SLC2A1 (0.39) HRH3SLC2A1TDP1CHRNB2CHRNB4
SCHEMBL1506206 0.82 LTA4H (0.44) THRBL3MBTL1ALDH1A1CHRNB2CHRNB4
SCHEMBL26312609 0.82 FURIN (0.42) THRBL3MBTL1ALDH1A1CHRNB2CHRNB4
SCHEMBL26312610 0.82 KCNA3 (0.44) HRH3THRBL3MBTL1ALDH1A1PRSS1
SCHEMBL1506385 0.82 CYP3A4 (0.41) HRH3THRBL3MBTL1ALDH1A1CHRNB2
SCHEMBL9636286 0.81 PPARG (0.37) HRH3THRB
SCHEMBL8905871 0.78 CHRNA7 (0.54) THRBL3MBTL1ALDH1A1CHRNB2CHRNB4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230296981-A1 RESIST MATERIAL AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-21 US disclosed
US-20230296981-A1 RESIST MATERIAL AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-21 US disclosed
US-20230296980-A1 RESIST MATERIAL AND PATTERN FORMING METHOD SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-21 US disclosed
US-20230296980-A1 RESIST MATERIAL AND PATTERN FORMING METHOD SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-21 US disclosed