SCHEMBL19846321

SCHEMBL19846321

O=S(=O)(O)CCOc1ccccc1I

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTR1A P08908 1/20 0.41
HTR7 P34969 1/20 0.41
LMNA P02545 3/20 0.37
MAPT P10636 2/20 0.37
JAK2 O60674 1/20 0.37
GAA P10253 1/20 0.37
ALDH1A1 P00352 5/20 0.36
SMN1; SMN2 Q16637 2/20 0.36
HPGD P15428 1/20 0.36
HTT P42858 1/20 0.36
CTSS P25774 1/20 0.35
NPC1 O15118 3/20 0.35
PTK2B Q14289 2/20 0.35
POLB P06746 2/20 0.35
KMT2A Q03164 2/20 0.35
KDM4E B2RXH2 2/20 0.34
RAB9A P51151 2/20 0.34
LTA4H P09960 1/20 0.34
TDP1 Q9NUW8 1/20 0.33
RECQL P46063 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14606832 0.81 HTR7 (0.42) HTR7LMNAMAPTJAK2GAA
SCHEMBL2317168 0.79 CYP2C9 (0.53) LMNAMAPTJAK2GAAALDH1A1
SCHEMBL22005000 0.78 MAPT (0.50) HTR1AHTR7LMNAMAPTJAK2
SCHEMBL19175124 0.77 L3MBTL1 (0.59) LMNAMAPTSMN1; SMN2HPGDPOLB
SCHEMBL19756117 0.76 S1PR3 (0.31)
SCHEMBL2705419 0.76 KDM4E (0.44) HTR1AHTR7LMNAMAPTJAK2
SCHEMBL22005040 0.76 KDM4E (0.44) HTR1AHTR7LMNAMAPTJAK2
SCHEMBL25476561 0.76 L3MBTL1 (0.41) LMNAMAPTJAK2GAAALDH1A1
SCHEMBL91232 0.75 ALDH1A1 (0.50) HTR7LMNAMAPTJAK2GAA
SCHEMBL22005008 0.74 NPC1 (0.47) LMNAMAPTJAK2GAAALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230273519-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD JSR CORPORATION (JP) 2023-08-31 US disclosed
US-20180039173-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-02-08 US disclosed