Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.32 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.32 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.32 |
| ▸ | ACACB | O00763 | 2/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | AOC3 | Q16853 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4965000 | 0.85 | SLC2A1 (0.35) | CYP1A2CYP3A4CYP2D6CYP2C9CYP2C19 | |
| SCHEMBL10231953 | 0.85 | IDO1 (0.37) | CYP1A2CYP3A4CYP2D6CYP2C9CYP2C19 | |
| SCHEMBL2631349 | 0.84 | LMNA (0.39) | — | |
| SCHEMBL18488301 | 0.81 | NPSR1 (0.35) | CYP1A2CYP3A4CYP2D6CYP2C9CYP2C19 | |
| SCHEMBL12019113 | 0.81 | ALDH1A1 (0.45) | CYP2C9MAPT | |
| SCHEMBL111985 | 0.81 | ALDH1A1 (0.45) | CYP2C9MAPT | |
| SCHEMBL25519766 | 0.81 | ADRA2A (0.35) | CYP1A2CYP3A4CYP2D6CYP2C9CYP2C19 | |
| SCHEMBL20000970 | 0.78 | NPSR1 (0.33) | CYP1A2CYP3A4CYP2D6CYP2C9CYP2C19 | |
| SCHEMBL24974017 | 0.77 | MAPT (0.46) | CYP2C9CYP2C19ACACBMAPT | |
| SCHEMBL24974023 | 0.77 | MAPT (0.46) | CYP2C9CYP2C19ACACBMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8158326-B2 | Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition | FUJIFILM CORPORATION (JP) | 2012-04-17 | — | — | US | disclosed |
| US-20090075202-A1 | PHOTOSENSITIVE COMPOSITION, COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION, AND METHOD OF PATTERN FORMATION WITH THE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2009-03-19 | — | — | US | disclosed |