SCHEMBL26317210

SCHEMBL26317210

CCC(C)c1ccc(S(=O)(=O)Oc2c(F)c(F)c(F)c(F)c2F)cc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 4/20 0.40
KMT2A Q03164 4/20 0.40
ALDH1A1 P00352 4/20 0.40
KDM4E B2RXH2 1/20 0.40
TSHR P16473 2/20 0.38
AKR1C3 P42330 1/20 0.34
CA1 P00915 2/20 0.34
CA2 P00918 2/20 0.34
CA9 Q16790 1/20 0.34
GAA P10253 2/20 0.34
USP2 O75604 1/20 0.34
PKM P14618 1/20 0.34
HPGD P15428 1/20 0.34
ALOX15 P16050 1/20 0.34
HSD17B10 Q99714 1/20 0.34
TDP1 Q9NUW8 2/20 0.33
MAPT P10636 1/20 0.33
THRB P10828 1/20 0.33
NPSR1 Q6W5P4 1/20 0.33
HDAC4 P56524 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26317220 0.82 ALDH1A1 (0.38) MEN1KMT2AALDH1A1KDM4ETSHR
SCHEMBL20526985 0.81 NR1I2 (0.38) MEN1KMT2AALDH1A1AKR1C3CA1
SCHEMBL10042819 0.77 ALDH1A1 (0.44) MEN1KMT2AALDH1A1KDM4ETSHR
SCHEMBL26317205 0.77 TDP1 (0.46) MEN1KMT2AALDH1A1KDM4ETSHR
SCHEMBL1830292 0.76 MEN1 (0.53) MEN1KMT2AALDH1A1TSHRAKR1C3
SCHEMBL2735044 0.76 ALDH1A1 (0.42) MEN1KMT2AALDH1A1KDM4ETSHR
SCHEMBL10042817 0.76 MEN1 (0.45) MEN1KMT2AALDH1A1KDM4ETSHR
SCHEMBL952515 0.75 KEAP1 (0.45) MEN1KMT2AALDH1A1CA1CA2
SCHEMBL8769185 0.75 GAA (0.56) MEN1KMT2AALDH1A1CA1CA2
SCHEMBL26317213 0.75 ALDH1A1 (0.40) MEN1KMT2AALDH1A1KDM4ETSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230296983-A1 PHOTOSENSITIVE POLYMER, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE SAMSUNG ELECTRONICS CO., LTD. (KR) 2023-09-21 US disclosed