SCHEMBL26327501

SCHEMBL26327501

CC(C)(c1ccc(-c2ccc3c(c2)C(=O)OC3=O)cc1)c1ccc(-c2ccc3c(c2)C(=O)OC3=O)cc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALOX15 P16050 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
ALDH1A1 P00352 4/20 0.40
MAPT P10636 2/20 0.38
NPC1 O15118 3/20 0.38
RAB9A P51151 3/20 0.38
L3MBTL1 Q9Y468 2/20 0.38
LMNA P02545 2/20 0.38
ATM Q13315 2/20 0.38
SMN1; SMN2 Q16637 2/20 0.38
MEN1 O00255 1/20 0.38
APAF1 O14727 1/20 0.38
THRB P10828 1/20 0.38
XBP1 P17861 1/20 0.38
PTBP1 P26599 1/20 0.38
HTT P42858 1/20 0.38
GALK1 P51570 1/20 0.38
BLM P54132 1/20 0.38
SMAD3 P84022 1/20 0.38
KMT2A Q03164 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31634589 0.89 ALDH1A1 (0.44) ALOX15TDP1ALDH1A1MAPTNPC1
SCHEMBL30071525 0.85 ALOX15 (0.46) ALOX15TDP1ALDH1A1NPC1RAB9A
SCHEMBL436366 0.85 ALOX15 (0.46) ALOX15TDP1ALDH1A1NPC1RAB9A
SCHEMBL15641977 0.84 ALOX15 (0.55) ALOX15TDP1ALDH1A1MAPTNPC1
SCHEMBL17192488 0.84 ALOX15 (0.55) ALOX15TDP1ALDH1A1MAPTNPC1
SCHEMBL308376 0.84 ALOX15 (0.55) ALOX15TDP1ALDH1A1MAPTNPC1
SCHEMBL29366467 0.84 ALOX15 (0.55) ALOX15TDP1ALDH1A1MAPTNPC1
SCHEMBL741462 0.82 ALOX15 (0.57) ALOX15TDP1ALDH1A1MAPTNPC1
SCHEMBL169305 0.82 ALOX15 (0.57) ALOX15TDP1ALDH1A1MAPTNPC1
SCHEMBL29359977 0.82 ALOX15 (0.57) ALOX15TDP1ALDH1A1MAPTNPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230350294-A1 Negative Photosensitive Resin Composition, Patterning Process, Interlayer Insulating Film, Surface Protection Film, And Electronic Component SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-02 US disclosed
US-11768434-B2 Polymer having a structure of polyamide, polyamide-imide, or polyimide, photosensitive resin composition, patterning process, photosensitive dry film, and protective film for electric and electronic parts SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-26 US disclosed