SCHEMBL26348235

SCHEMBL26348235

C=C(C)C(=O)Nc1cc(O)cc(O)c1

nearest known ligand 0.63

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.63
TDP1 Q9NUW8 3/20 0.53
RXFP1 Q9HBX9 1/20 0.50
NQO2 P16083 2/20 0.46
ALDH1A1 P00352 5/20 0.44
KDM4E B2RXH2 1/20 0.44
POLB P06746 3/20 0.44
L3MBTL1 Q9Y468 3/20 0.44
RECQL P46063 2/20 0.44
BLM P54132 2/20 0.44
CA5A P35218 1/20 0.41
CYP1A2 P05177 1/20 0.41
BAZ1A Q9NRL2 1/20 0.40
CA12 O43570 2/20 0.38
CA1 P00915 2/20 0.38
CA2 P00918 2/20 0.38
CA7 P43166 2/20 0.38
CA9 Q16790 2/20 0.38
CA14 Q9ULX7 2/20 0.38
MEN1 O00255 2/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9622088 0.86 TDP1 (0.53) LMNATDP1RXFP1NQO2ALDH1A1
SCHEMBL13921951 0.82 SMN1; SMN2 (0.44) LMNATDP1RXFP1ALDH1A1POLB
SCHEMBL216958 0.81 TDP1 (0.70) TDP1RXFP1ALDH1A1KDM4EPOLB
SCHEMBL587695 0.80 TDP1 (0.50) LMNATDP1RXFP1ALDH1A1KDM4E
SCHEMBL124216 0.79 RXFP1 (0.65) LMNATDP1RXFP1NQO2ALDH1A1
SCHEMBL26348237 0.79 TDP1 (0.49) LMNATDP1RXFP1ALDH1A1KDM4E
SCHEMBL13921948 0.79 DHODH (0.51) LMNATDP1RXFP1ALDH1A1KDM4E
SCHEMBL439393 0.78 RXFP1 (0.74) TDP1RXFP1ALDH1A1KDM4EPOLB
SCHEMBL9807676 0.78 LMNA (1.00) LMNATDP1NQO2ALDH1A1KDM4E
SCHEMBL27927619 0.78 TDP1 (0.51) LMNATDP1RXFP1ALDH1A1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230305398-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-28 US disclosed