Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.70 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.68 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.68 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.54 |
| ▸ | MEN1 | O00255 | 1/20 | 0.54 |
| ▸ | NPC1 | O15118 | 4/20 | 0.53 |
| ▸ | RAB9A | P51151 | 4/20 | 0.53 |
| ▸ | SMN1; SMN2 | Q16637 | 4/20 | 0.53 |
| ▸ | STAT3 | P40763 | 1/20 | 0.53 |
| ▸ | STAT1 | P42224 | 1/20 | 0.53 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.51 |
| ▸ | TP53 | P04637 | 3/20 | 0.51 |
| ▸ | MAPT | P10636 | 2/20 | 0.51 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.51 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.51 |
| ▸ | NLRP3 | Q96P20 | 3/20 | 0.50 |
| ▸ | HTT | P42858 | 3/20 | 0.49 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.49 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.49 |
| ▸ | GPR35 | Q9HC97 | 1/20 | 0.48 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1098272 | 0.89 | TDP1 (0.79) | TDP1ALDH1A1CYP1A2RAB9AKDM4E | |
| SCHEMBL29473480 | 0.85 | ALDH1A1 (0.70) | ALDH1A1CYP1A2KMT2AMEN1NPC1 | |
| SCHEMBL31598572 | 0.82 | ALDH1A1 (0.58) | TDP1ALDH1A1CYP1A2KMT2AMEN1 | |
| SCHEMBL8477048 | 0.82 | TDP1 (0.70) | TDP1ALDH1A1CYP1A2KMT2AMEN1 | |
| SCHEMBL5421444 | 0.82 | TDP1 (1.00) | TDP1ALDH1A1CYP1A2KMT2AMEN1 | |
| SCHEMBL29473476 | 0.81 | ALDH1A1 (0.67) | ALDH1A1CYP1A2KMT2AMEN1NPC1 | |
| Metacetamol SCHEMBL31195432 | 0.81 | ALDH1A1 (1.00) | ALDH1A1CYP1A2KMT2AMEN1NPC1 | |
| Metacetamol SCHEMBL181254 | 0.81 | ALDH1A1 (1.00) | ALDH1A1CYP1A2KMT2AMEN1NPC1 | |
| SCHEMBL26348235 | 0.81 | LMNA (0.63) | TDP1ALDH1A1CYP1A2KMT2AMEN1 | |
| SCHEMBL23053168 | 0.81 | TDP1 (0.68) | TDP1ALDH1A1CYP1A2RAB9AKDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 681 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1845415-B1 | Process for producing an image using a first minimum bottom antireflective coating composition | AZ ELECTRONIC MATERIALS USA (US) | 2014-04-30 | — | — | EP | claimed |
| EP-1465877-B1 | POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING | AZ ELECTRONIC MATERIALS USA (US) | 2008-09-24 | — | — | EP | claimed |
| EP-1845415-A2 | Process for producing an image using a first minimum bottom antireflective coating composition | AZ Electronic Materials USA Corp. (US) | 2007-10-17 | — | — | EP | claimed |
| EP-1720066-A2 | Process for producing an image using a first minimum bottom antireflective coating composition | AZ Electronic Materials USA Corp. (US) | 2006-11-08 | — | — | EP | claimed |
| US-20060199103-A1 | Process for producing an image using a first minimum bottom antireflective coating composition | NEISSER MARK O | 2006-09-07 | — | — | US | claimed |
| EP-1466216-B1 | PROCESS FOR PRODUCING AN IMAGE USING A FIRST MINIMUM BOTTOM ANTIREFLECTIVE COATING COMPOSITION | AZ ELECTRONIC MATERIALS USA (US) | 2006-07-26 | — | — | EP | claimed |
| US-7070914-B2 | Process for producing an image using a first minimum bottom antireflective coating composition | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2006-07-04 | — | — | US | claimed |
| EP-1038668-B1 | Photosensitive composition and planographic printing plate precursor using same | FUJI PHOTO FILM CO LTD (JP) | 2005-05-25 | — | — | EP | claimed |
| CN-1196030-C | Antireflective coating for photoresist compositions | CLARIANT FINANCE BVI LTD (VG) | 2005-04-06 | — | — | CN | claimed |
| US-6844131-B2 | Positive-working photoimageable bottom antireflective coating | CLARIANT FINANCE (BVI) LIMITED (VG) | 2005-01-18 | — | — | US | claimed |
| US-20030129547-A1 | Process for producing an image using a first minimum bottom antireflective coating composition | MERCK PATENT GMBH (DE) | 2003-07-10 | — | — | US | claimed |
| CN-1111760-C | The antireflecting coating that is used for photo-corrosion-resisting agent composition | CLARIANT INT LTD (CH) | 2003-06-18 | — | — | CN | claimed |
| CN-1367884-A | Antireflective coating for photoresist compositions | CLARIANT FINANCE BVI LTD (VG) | 2002-09-04 | — | — | CN | claimed |
| US-6355396-B1 | HIGH SENSITIVITY AND GOOD LATITUDE IN DEVELOPMENT, FOR PRODUCING DIRECT PLATE PRODUCTION PROCESS AND ENABLES AN IMAGE TO BE FORMED WITH HIGH SENSITIVITY WITH AN INFRARED LASER | FUJI PHOTO FILM CO., LTD. (JP) | 2002-03-12 | — | — | US | claimed |
| US-6132929-A | Positive type photosensitive composition for infrared lasers | FUJI PHOTO FILM CO., LTD. (JP) | 2000-10-17 | — | — | US | claimed |
| EP-1038668-A2 | Photosensitive composition and planographic printing plate precursor using same | FUJI PHOTO FILM CO., LTD. (JP) | 2000-09-27 | — | — | EP | claimed |
| CN-1232552-A | Antireflective coating for photoresist compositions | CLARIANT INT LTD (CH) | 1999-10-20 | — | — | CN | claimed |
| CN-1227638-A | Antireflective coatings for photoresist resin compositions | CLARIANT INTERNATIONAL CO LTD (CH) | 1999-09-01 | — | — | CN | claimed |
| EP-0914964-A2 | Positive type photosensitive composition for infrared lasers | FUJI PHOTO FILM CO., LTD. (JP) | 1999-05-12 | — | — | EP | claimed |
| WO-1994014410-A1 | NEW SUNBLOCKING POLYMERS AND THEIR FORMULATION | BIOPHYSICA, INC. (US) | 1994-07-07 | — | — | WO | claimed |