Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.50 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.47 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.42 |
| ▸ | POLB | P06746 | 3/20 | 0.42 |
| ▸ | RECQL | P46063 | 1/20 | 0.42 |
| ▸ | BLM | P54132 | 1/20 | 0.42 |
| ▸ | GAA | P10253 | 3/20 | 0.40 |
| ▸ | MEN1 | O00255 | 1/20 | 0.40 |
| ▸ | G6PD | P11413 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.40 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.39 |
| ▸ | BAZ1A | Q9NRL2 | 1/20 | 0.38 |
| ▸ | DHODH | Q02127 | 1/20 | 0.38 |
| ▸ | CA1 | P00915 | 1/20 | 0.38 |
| ▸ | CA2 | P00918 | 1/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.38 |
| ▸ | CYTH2 | Q99418 | 1/20 | 0.38 |
| ▸ | RORC | P51449 | 1/20 | 0.36 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22200957 | 0.91 | TDP1 (0.46) | TDP1RXFP1L3MBTL1POLBRECQL | |
| SCHEMBL23539085 | 0.86 | GAA (0.47) | TDP1L3MBTL1POLBGAAMEN1 | |
| SCHEMBL22200937 | 0.80 | TDP1 (0.54) | TDP1RXFP1L3MBTL1POLBRECQL | |
| SCHEMBL26348235 | 0.80 | LMNA (0.63) | TDP1RXFP1L3MBTL1POLBRECQL | |
| SCHEMBL2552398 | 0.79 | LMNA (0.61) | TDP1L3MBTL1GAAMEN1G6PD | |
| SCHEMBL26348237 | 0.79 | TDP1 (0.49) | TDP1RXFP1L3MBTL1POLBRECQL | |
| SCHEMBL13921948 | 0.79 | DHODH (0.51) | TDP1RXFP1L3MBTL1POLBRECQL | |
| SCHEMBL10315635 | 0.79 | POLB (0.59) | TDP1RXFP1L3MBTL1POLBRECQL | |
| SCHEMBL4740889 | 0.77 | CYTH2 (0.47) | TDP1L3MBTL1POLBGAAMEN1 | |
| SCHEMBL9807633 | 0.77 | GAA (0.69) | TDP1RXFP1L3MBTL1POLBRECQL |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-1532566-B | Radiation sensitive composition for color filter | JSR CORP | 2010-05-12 | — | — | CN | claimed |
| US-20230305398-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-28 | — | — | US | disclosed |
| WO-2023007972-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION | 日産化学株式会社 | 2023-02-02 | — | — | WO | disclosed |
| EP-3691004-A1 | ELECTROCHEMICAL-ELEMENT BINDER COMPOSITION, ELECTROCHEMICAL-ELEMENT SLURRY COMPOSITION, ELECTROCHEMICAL-ELEMENT FUNCTIONAL LAYER, AND ELECTROCHEMICAL ELEMENT | Zeon Corporation (JP) | 2020-08-05 | — | — | EP | disclosed |
| US-20200218154-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-07-09 | — | — | US | disclosed |
| EP-2913352-B1 | NON-PHOTOSENSITIVE RESIN COMPOSITION | NISSAN CHEMICAL IND LTD (JP) | 2018-05-02 | — | — | EP | disclosed |
| US-9823391-B2 | Non-photosensitive resin composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-11-21 | — | — | US | disclosed |
| US-20150338556-A1 | NON-PHOTOSENSITIVE RESIN COMPOSITION | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-11-26 | — | — | US | disclosed |
| EP-2913352-A1 | NON-PHOTOSENSITIVE RESIN COMPOSITION | Nissan Chemical Industries, Ltd. (JP) | 2015-09-02 | — | — | EP | disclosed |
| US-8623590-B2 | Pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-01-07 | — | — | US | disclosed |
| US-8623590-B2 | Pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-01-07 | — | — | US | disclosed |
| US-20120108043-A1 | PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-05-03 | — | — | US | disclosed |
| US-20120108043-A1 | PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-05-03 | — | — | US | disclosed |
| EP-1577330-B1 | Copolymer, image-forming composition and plate for lithography | OKAMOTO CHEMICAL INDUSTRY CO LTD (JP) | 2012-02-15 | — | — | EP | disclosed |
| EP-1577330-A1 | Copolymer, image-froming composition and plate for lithography | Okamoto Chemical Industry Co., Ltd (JP) | 2005-09-21 | — | — | EP | disclosed |
| US-20050042546-A1 | Base plate for lithographic printing plate | OKAMOTO CHEMICAL INDUSTRY CO. LTD. | 2005-02-24 | — | — | US | disclosed |