Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX1 | P07099 | 3/20 | 0.48 |
| ▸ | MEN1 | O00255 | 2/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.48 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.47 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.47 |
| ▸ | POLB | P06746 | 1/20 | 0.47 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.47 |
| ▸ | HTT | P42858 | 1/20 | 0.46 |
| ▸ | RAB9A | P51151 | 1/20 | 0.46 |
| ▸ | IDO1 | P14902 | 1/20 | 0.45 |
| ▸ | CASP6 | P55212 | 1/20 | 0.45 |
| ▸ | ENPP2 | Q13822 | 1/20 | 0.45 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1205029 | 0.83 | CCR5 (0.50) | ENPP2 | |
| SCHEMBL21872794 | 0.80 | ENPP2 (0.60) | EPHX1MEN1KMT2AALDH1A1L3MBTL1 | |
| SCHEMBL24497087 | 0.79 | KMT2A (0.64) | EPHX1MEN1KMT2AALDH1A1POLB | |
| SCHEMBL2199000 | 0.77 | EPHX1 (0.72) | EPHX1MEN1KMT2AALDH1A1POLB | |
| SCHEMBL26386361 | 0.77 | KMT2A (0.42) | MEN1KMT2AALDH1A1SMN1; SMN2POLB | |
| SCHEMBL13543078 | 0.77 | CCR5 (0.46) | — | |
| SCHEMBL567201 | 0.76 | ALDH1A1 (0.51) | MEN1KMT2AALDH1A1SMN1; SMN2POLB | |
| SCHEMBL13684200 | 0.76 | ALDH1A1 (0.54) | ALDH1A1SMN1; SMN2POLBL3MBTL1HTT | |
| SCHEMBL6141087 | 0.76 | TDP1 (0.59) | MEN1KMT2AALDH1A1POLBL3MBTL1 | |
| SCHEMBL31095809 | 0.75 | ALDH1A1 (0.46) | MEN1KMT2AALDH1A1SMN1; SMN2HTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230384679-A1 | PHOTORESIST UNDER-LAYER AND METHOD OF FORMING PHOTORESIST PATTERN | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2023-11-30 | — | — | US | disclosed |
| US-20230375924-A1 | EUV Metallic Resist Performance Enhancement Via Additives | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2023-11-23 | — | — | US | disclosed |
| US-20230367216-A1 | BOTTOM ANTIREFLECTIVE COATING MATERIALS | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2023-11-16 | — | — | US | disclosed |
| US-11796918-B2 | Underlayer material for photoresist | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2023-10-24 | — | — | US | disclosed |
| US-11782345-B2 | Bottom antireflective coating materials | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2023-10-10 | — | — | US | disclosed |