SCHEMBL26412939

SCHEMBL26412939

CC(CCC(=O)OC(C)(C)C1CCNCC1)(c1ccc(O)cc1)c1ccc(O)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ESR2 Q92731 6/20 0.50
▸ ESR1 P03372 5/20 0.50
▸ CYP3A4 P08684 2/20 0.50
▸ ALDH1A1 P00352 1/20 0.50
▸ CHEK1 O14757 1/20 0.33
▸ FYN P06241 1/20 0.33
▸ PDGFRB P09619 1/20 0.33
▸ PIM1 P11309 1/20 0.33
▸ FGFR1 P11362 1/20 0.33
▸ FLT1 P17948 1/20 0.33
▸ GRK5 P34947 1/20 0.33
▸ MAP2K2 P36507 1/20 0.33
▸ MAPK8 P45983 1/20 0.33
▸ CDK8 P49336 1/20 0.33
▸ RPS6KA3 P51812 1/20 0.33
▸ PRKX P51817 1/20 0.33
▸ JAK3 P52333 1/20 0.33
▸ LIMK1 P53667 1/20 0.33
▸ BTK Q06187 1/20 0.33
▸ TYRO3 Q06418 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22372823 0.84 ITGB3 (0.41) ESR1CYP3A4ALDH1A1LMNAMEN1
SCHEMBL25142203 0.82 ALDH1A1 (0.32) ESR2ESR1CYP3A4ALDH1A1
SCHEMBL23870862 0.81 ALDH1A1 (0.32) ESR2ESR1CYP3A4ALDH1A1
SCHEMBL22372985 0.81 CYP19A1 (0.38) ESR2ESR1ALDH1A1
SCHEMBL22373023 0.79 GABRP (0.33) LMNAMEN1CYP2D6HRH1SCN1A
SCHEMBL25142149 0.79 ELANE (0.33) ESR2ESR1CYP3A4ALDH1A1
SCHEMBL23867035 0.78 ELANE (0.33) —
SCHEMBL7122766 0.78 ESR1 (0.65) ESR2ESR1CYP3A4ALDH1A1CHEK1
SCHEMBL24179412 0.78 — —
SCHEMBL22373040 0.76 GNAI3 (0.36) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 — — US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 — — US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR ESR2 3290/4885ESR1 2739/4885CYP3A4 4746/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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