SCHEMBL26413402

SCHEMBL26413402

O=C(OC1(c2ccccc2)CCNCC1)c1ccc(Cl)cc1O

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 2/20 0.37
SPR P35270 1/20 0.37
TACR1 P25103 1/20 0.37
MAPT P10636 2/20 0.36
SMN1; SMN2 Q16637 2/20 0.36
NPC1 O15118 1/20 0.36
HPGD P15428 1/20 0.36
RAB9A P51151 1/20 0.36
KDM4E B2RXH2 2/20 0.35
RXFP1 Q9HBX9 2/20 0.35
ALDH1A1 P00352 2/20 0.35
DRD2 P14416 1/20 0.35
PTGDR2 Q9Y5Y4 1/20 0.35
AR P10275 1/20 0.35
ESR1 P03372 1/20 0.35
ESR2 Q92731 1/20 0.35
PKM P14618 1/20 0.35
HTT P42858 1/20 0.35
CA1 P00915 1/20 0.34
CA2 P00918 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944298 0.90 NPC1 (0.45) OPRM1TACR1MAPTSMN1; SMN2NPC1
SCHEMBL24944199 0.88 SERPINE1 (0.46) OPRM1MAPTSMN1; SMN2NPC1HPGD
SCHEMBL26478643 0.87 OPRM1 (0.39) OPRM1TACR1MAPTSMN1; SMN2NPC1
SCHEMBL24943691 0.87 OPRM1 (0.41) OPRM1TACR1MAPTSMN1; SMN2NPC1
SCHEMBL26413407 0.86 ALDH1A1 (0.42) OPRM1TACR1MAPTSMN1; SMN2NPC1
SCHEMBL26413482 0.85 OPRM1 (0.42) OPRM1TACR1MAPTSMN1; SMN2NPC1
SCHEMBL26413500 0.85 AVPR2 (0.39) OPRM1MAPTSMN1; SMN2HPGDALDH1A1
SCHEMBL24944311 0.84 HPGD (0.44) OPRM1MAPTSMN1; SMN2NPC1HPGD
SCHEMBL24943684 0.84 OPRM1 (0.41) OPRM1TACR1MAPTDRD2PTGDR2
SCHEMBL26478645 0.84 OPRM1 (0.39) OPRM1TACR1DRD2PTGDR2TP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR OPRM1 775/4885SPR 4241/4885TACR1 2183/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.