SCHEMBL26413482

SCHEMBL26413482

Cc1ccc(C(=O)OC2(c3ccccc3)CCNCC2)c(O)c1

nearest known ligand 0.43

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 2/20 0.42
KMT2A Q03164 2/20 0.41
MEN1 O00255 1/20 0.41
IDO1 P14902 2/20 0.39
TDO2 P48775 2/20 0.39
NPC1 O15118 3/20 0.39
RAB9A P51151 3/20 0.39
KDM4E B2RXH2 2/20 0.38
ALDH1A1 P00352 1/20 0.37
LMNA P02545 1/20 0.37
POLB P06746 1/20 0.37
TACR1 P25103 1/20 0.37
TP53 P04637 1/20 0.35
MAPT P10636 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
PKM P14618 1/20 0.34
PIK3CG P48736 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26413484 0.90 CSNK2A1 (0.43) OPRM1KMT2AMEN1NPC1RAB9A
SCHEMBL24944858 0.89 OPRM1 (0.43) OPRM1KMT2AMEN1NPC1RAB9A
SCHEMBL24944199 0.88 SERPINE1 (0.46) OPRM1KMT2AMEN1NPC1RAB9A
SCHEMBL26478772 0.87 OPRM1 (0.44) OPRM1NPC1RAB9ATACR1TP53
SCHEMBL24944093 0.86 OPRM1 (0.43) OPRM1KMT2AMEN1NPC1KDM4E
SCHEMBL26413581 0.86 LMNA (0.49) KMT2AMEN1NPC1RAB9AALDH1A1
SCHEMBL26413402 0.85 OPRM1 (0.37) OPRM1NPC1RAB9AKDM4EALDH1A1
SCHEMBL24944097 0.85 OPRM1 (0.44) OPRM1TACR1
SCHEMBL24944311 0.84 HPGD (0.44) OPRM1NPC1RAB9AKDM4EALDH1A1
SCHEMBL26413497 0.84 P2RX7 (0.44) OPRM1KMT2AMEN1NPC1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR OPRM1 775/4885KMT2A 1033/4885MEN1 3578/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.