SCHEMBL24944199

SCHEMBL24944199

O=C(OC1(c2ccccc2)CCNCC1)c1ccc(O)cc1O

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SERPINE1 P05121 1/20 0.46
CA12 O43570 4/20 0.43
CA1 P00915 4/20 0.43
CA2 P00918 4/20 0.43
CA7 P43166 4/20 0.43
CA9 Q16790 4/20 0.43
CA14 Q9ULX7 4/20 0.43
PDK2 Q15119 1/20 0.43
PDK4 Q16654 1/20 0.43
MEN1 O00255 3/20 0.42
KMT2A Q03164 3/20 0.42
USP2 O75604 1/20 0.42
GAA P10253 1/20 0.42
KEAP1 Q14145 1/20 0.42
NFE2L2 Q16236 1/20 0.42
ALDH1A1 P00352 2/20 0.41
TDP1 Q9NUW8 2/20 0.41
KDM4E B2RXH2 1/20 0.41
CYP3A4 P08684 1/20 0.41
MAPT P10636 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944843 0.90 CA12 (0.43) CA12CA1CA2CA7CA9
SCHEMBL24944297 0.89 OPRM1 (0.38) MEN1KMT2AMAPTHPGDSMN1; SMN2
SCHEMBL26413581 0.88 LMNA (0.49) MEN1KMT2AUSP2ALDH1A1CYP3A4
SCHEMBL26413482 0.88 OPRM1 (0.42) MEN1KMT2AALDH1A1KDM4EMAPT
SCHEMBL26413402 0.88 OPRM1 (0.37) CA1CA2ALDH1A1KDM4ECYP3A4
SCHEMBL24944876 0.87 ESR1 (0.41) MEN1KMT2AUSP2MAPTMAPK1
SCHEMBL24944311 0.87 HPGD (0.44) CA12CA1CA2CA7CA9
SCHEMBL24944305 0.85 MEN1 (0.38) MEN1KMT2ASMN1; SMN2OPRM1
SCHEMBL24944936 0.85 SMN1; SMN2 (0.40) MEN1KMT2AUSP2GAAALDH1A1
SCHEMBL26413460 0.84 OPRM1 (0.40) MEN1KMT2AGAAMAPTOPRM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR SERPINE1 4718/4885CA12 2480/4885CA1 1910/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.