SCHEMBL26413446

SCHEMBL26413446

CC(C)OC(=O)/C=C/C(=O)OC1(c2ccccc2)CCNCC1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 5/20 0.41
HCAR2 Q8TDS4 2/20 0.41
CA12 O43570 1/20 0.40
AKR1B10 O60218 1/20 0.40
CA1 P00915 1/20 0.40
CA2 P00918 1/20 0.40
AKR1B1 P15121 1/20 0.40
CA7 P43166 1/20 0.40
CA9 Q16790 1/20 0.40
CA14 Q9ULX7 1/20 0.40
APOBEC3A P31941 1/20 0.34
APOBEC3G Q9HC16 1/20 0.34
KDM4E B2RXH2 1/20 0.34
GLA P06280 1/20 0.34
MAPT P10636 1/20 0.34
HTT P42858 1/20 0.34
RECQL P46063 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
TSHR P16473 1/20 0.33
SIGMAR1 Q99720 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944588 0.85 OPRM1 (0.44) OPRM1HCAR2CA12CA1CA2
SCHEMBL24944262 0.84 OPRM1 (0.45) OPRM1SIGMAR1OPRD1OPRK1HTR2A
SCHEMBL24944587 0.84 OPRM1 (0.45) OPRM1SIGMAR1OPRD1OPRK1HTR2A
SCHEMBL26413364 0.82 OPRM1 (0.56) OPRM1HCAR2CA12CA1CA2
SCHEMBL24944237 0.81 LMNA (0.43) OPRM1HCAR2CA12AKR1B10AKR1B1
SCHEMBL26413373 0.81 OPRM1 (0.42) OPRM1HTTSIGMAR1OPRD1OPRK1
SCHEMBL26413343 0.81 OPRM1 (0.48) OPRM1SIGMAR1OPRD1OPRK1
SCHEMBL24944874 0.80 OPRM1 (0.39) OPRM1SIGMAR1OPRD1OPRK1HTR2A
SCHEMBL24943654 0.79 MAPT (0.46) OPRM1MAPTHTTSMN1; SMN2KMT2A
SCHEMBL26413348 0.79 OPRM1 (0.43) OPRM1SIGMAR1OPRD1OPRK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR OPRM1 775/4885HCAR2 3689/4885CA12 2480/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.