SCHEMBL24944874

SCHEMBL24944874

N/C=C(N)/C=C/C(=O)OC1(c2ccccc2)CCNCC1

nearest known ligand 0.39

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 5/20 0.39
HTR2A P28223 1/20 0.33
HDAC1 Q13547 1/20 0.32
TACR1 P25103 3/20 0.32
DPP9 Q86TI2 1/20 0.32
DPP7 Q9UHL4 1/20 0.32
SIGMAR1 Q99720 1/20 0.31
NPFFR1 Q9GZQ6 1/20 0.31
NPFFR2 Q9Y5X5 1/20 0.31
OPRD1 P41143 3/20 0.30
OPRK1 P41145 3/20 0.30
AKT2 P31751 1/20 0.30
CYP1A2 P05177 1/20 0.30
CYP2D6 P10635 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26421434 0.84 OPRM1 (0.38) OPRM1HTR2AHDAC1TACR1DPP9
SCHEMBL24944588 0.83 OPRM1 (0.44) OPRM1HTR2AHDAC1SIGMAR1OPRD1
SCHEMBL24944262 0.81 OPRM1 (0.45) OPRM1HTR2AHDAC1TACR1SIGMAR1
SCHEMBL24944237 0.81 LMNA (0.43) OPRM1HDAC1CYP1A2CYP2D6
SCHEMBL24944587 0.81 OPRM1 (0.45) OPRM1HTR2AHDAC1TACR1SIGMAR1
SCHEMBL26413364 0.80 OPRM1 (0.56) OPRM1OPRD1OPRK1
SCHEMBL26413446 0.80 OPRM1 (0.41) OPRM1HTR2ASIGMAR1OPRD1OPRK1
SCHEMBL23647372 0.79 OPRM1 (0.47) OPRM1HTR2AHDAC1TACR1DPP9
SCHEMBL26413649 0.79 CYP1B1 (0.43) OPRM1
SCHEMBL24944254 0.78 OPRM1 (0.47) OPRM1HTR2AHDAC1TACR1DPP9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR OPRM1 775/4885HTR2A 3805/4885HDAC1 2046/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.