SCHEMBL24944313

SCHEMBL24944313

O=C(OC1(c2ccccc2)CCNCC1)c1ccc(O)cc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 3/20 0.42
ESR2 Q92731 2/20 0.42
LMNA P02545 2/20 0.42
OPRM1 P35372 2/20 0.42
HDAC1 Q13547 1/20 0.40
CES2 O00748 1/20 0.39
MIF P14174 1/20 0.38
TACR1 P25103 1/20 0.38
CA12 O43570 1/20 0.38
CA1 P00915 1/20 0.38
CA2 P00918 1/20 0.38
CA7 P43166 1/20 0.38
CA9 Q16790 1/20 0.38
CA14 Q9ULX7 1/20 0.38
F2 P00734 1/20 0.37
ALDH1A1 P00352 1/20 0.36
CHRM1 P11229 1/20 0.36
TSHR P16473 1/20 0.36
SLC6A2 P23975 1/20 0.36
KDR P35968 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24943664 0.91 OPRM1 (0.46) LMNAOPRM1HDAC1TACR1F2
SCHEMBL26413775 0.89 ALDH1A1 (0.46) LMNAOPRM1HDAC1F2ALDH1A1
SCHEMBL24943754 0.89 SMN1; SMN2 (0.43) OPRM1HDAC1ALDH1A1TSHRMAPT
SCHEMBL24944081 0.87 OPRM1 (0.44) LMNAOPRM1HDAC1ALDH1A1TDP1
SCHEMBL26478635 0.87 HDAC1 (0.41) LMNAOPRM1HDAC1F2ALDH1A1
SCHEMBL26413644 0.87 PARP10 (0.44) LMNAOPRM1HDAC1F2TSHR
SCHEMBL24943674 0.87 NPC1 (0.43) LMNAOPRM1HDAC1F2ALDH1A1
SCHEMBL24944860 0.87 OPRM1 (0.47) OPRM1HDAC1CES2TACR1TDP1
SCHEMBL24944620 0.87 DRD2 (0.43) OPRM1HDAC1CES2TACR1TSHR
SCHEMBL26413444 0.87 OPRM1 (0.41) LMNAOPRM1HDAC1TACR1F2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR ESR1 2739/4885ESR2 3290/4885LMNA 2930/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.