SCHEMBL26413558

SCHEMBL26413558

COc1cccc(C(=O)OC2(c3ccccc3)CCNCC2)c1[N+](=O)[O-]

nearest known ligand 0.41

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 3/20 0.41
KMT2A Q03164 5/20 0.39
HPGD P15428 1/20 0.39
SIGMAR1 Q99720 1/20 0.39
CYP1A2 P05177 2/20 0.38
MAPT P10636 2/20 0.38
CYP2C19 P33261 2/20 0.38
CYP3A4 P08684 1/20 0.38
CYP2C9 P11712 1/20 0.38
MEN1 O00255 3/20 0.37
ALDH1A1 P00352 2/20 0.37
RAB9A P51151 1/20 0.36
OPRM1 P35372 1/20 0.36
AR P10275 1/20 0.35
KCNA3 P22001 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
PKM P14618 1/20 0.35
HPD P32754 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26413576 0.88 POLB (0.45) SMN1; SMN2KMT2AHPGDMAPTMEN1
SCHEMBL26413433 0.87 GPR35 (0.37) HPGDALDH1A1OPRM1TDP1
SCHEMBL26413478 0.86 SIGMAR1 (0.46) KMT2AHPGDSIGMAR1MAPTMEN1
SCHEMBL26413398 0.86 NPC1 (0.36) SMN1; SMN2KMT2AMAPTMEN1RAB9A
SCHEMBL24944222 0.84 SIGMAR1 (0.42) KMT2ASIGMAR1MAPTMEN1ALDH1A1
SCHEMBL24944092 0.84 KMT2A (0.49) KMT2ASIGMAR1MEN1ALDH1A1RAB9A
SCHEMBL24944652 0.84 SIGMAR1 (0.42) KMT2ASIGMAR1MEN1ALDH1A1OPRM1
SCHEMBL24943730 0.84 KDM4E (0.47) KMT2AMAPTCYP3A4MEN1ALDH1A1
SCHEMBL26413556 0.83 TSHR (0.50) SMN1; SMN2KMT2ACYP1A2MAPTCYP2C19
SCHEMBL26413453 0.82 ALDH1A1 (0.41) SMN1; SMN2KMT2AMAPTALDH1A1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR SMN1; SMN2 1285/4885KMT2A 1033/4885HPGD 4346/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.