SCHEMBL26413641

SCHEMBL26413641

CC1(C)C(C(=O)OC2(c3ccccc3)CCNCC2)C1(C)C

nearest known ligand 0.45

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
OPRM1 P35372 6/20 0.45
HTT P42858 1/20 0.39
OPRD1 P41143 3/20 0.38
OPRK1 P41145 3/20 0.38
HTR2A P28223 1/20 0.36
TACR1 P25103 1/20 0.35
HDAC1 Q13547 1/20 0.34
MEN1 O00255 1/20 0.34
KMT2A Q03164 1/20 0.34
KDM1A O60341 1/20 0.34
MAOA P21397 1/20 0.34
SSTR4 P31391 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26413345 0.84 OPRM1 (0.51) OPRM1OPRD1OPRK1HTR2ATACR1
SCHEMBL24944575 0.82 OPRM1 (0.43) OPRM1OPRD1OPRK1HTR2ATACR1
SCHEMBL11602249 0.80 OPRM1 (0.50) OPRM1OPRD1OPRK1HTR2ATACR1
SCHEMBL24944245 0.80 OPRM1 (0.42) OPRM1HTTOPRD1OPRK1HTR2A
SCHEMBL24944233 0.80 OPRM1 (0.42) OPRM1OPRD1OPRK1HTR2ATACR1
SCHEMBL24944579 0.80 OPRM1 (0.42) OPRM1HTTOPRD1OPRK1HTR2A
SCHEMBL373568 0.80 OPRM1 (0.50) OPRM1OPRD1OPRK1HTR2ATACR1
SCHEMBL26413577 0.80 OPRM1 (0.42) OPRM1HTTOPRD1OPRK1HTR2A
SCHEMBL24944239 0.79 OPRM1 (0.49) OPRM1OPRD1OPRK1HTR2ATACR1
SCHEMBL24944270 0.79 OPRM1 (0.41) OPRM1OPRD1OPRK1HTR2ATACR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR OPRM1 775/4885HTT 594/4885OPRD1 1348/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.