Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GPR119 | Q8TDV5 | 16/20 | 0.47 |
| ▸ | SCN9A | Q15858 | 1/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.42 |
| ▸ | MAPT | P10636 | 1/20 | 0.42 |
| ▸ | THRB | P10828 | 1/20 | 0.42 |
| ▸ | PKM | P14618 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26426653 | 0.91 | GPR119 (0.39) | GPR119SCN9A | |
| SCHEMBL26427846 | 0.84 | HTR4 (0.38) | GPR119 | |
| SCHEMBL21705210 | 0.84 | HTR4 (0.42) | — | |
| SCHEMBL26836354 | 0.82 | GPR119 (0.48) | GPR119SCN9AKDM4EMAPTTHRB | |
| SCHEMBL22277450 | 0.81 | MAPT (0.42) | GPR119KDM4EMAPTTHRB | |
| SCHEMBL21705235 | 0.81 | GPR119 (0.48) | GPR119KDM4EPKM | |
| SCHEMBL26834873 | 0.79 | CHRM2 (0.37) | SCN9AKDM4E | |
| SCHEMBL26426644 | 0.77 | PIM1 (0.35) | — | |
| SCHEMBL26426679 | 0.76 | NAMPT (0.46) | GPR119KDM4EMAPTTHRB | |
| SCHEMBL18891231 | 0.75 | KDM4E (0.64) | GPR119KDM4EPKM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11835859-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-05 | — | — | US | disclosed |
| US-20230129578-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| US-20230129578-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |