SCHEMBL26426653

SCHEMBL26426653

CCC(C)(C)OC(=O)N1CCC(CCOC(=O)c2cc(I)cc(I)c2I)CC1

nearest known ligand 0.39

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
GPR119 Q8TDV5 15/20 0.39
SCN9A Q15858 1/20 0.37
NOTCH1 P46531 1/20 0.35
CHRM4 P08173 1/20 0.34
DPP4 P27487 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26426652 0.91 GPR119 (0.47) GPR119SCN9A
SCHEMBL21705757 0.85 HTR4 (0.43)
SCHEMBL24179407 0.84 DPP4 (0.35) GPR119DPP4
SCHEMBL26427846 0.82 HTR4 (0.38) GPR119CHRM4
SCHEMBL21705236 0.82 GPR119 (0.40) GPR119NOTCH1CHRM4
SCHEMBL26834873 0.77 CHRM2 (0.37) SCN9ACHRM4
SCHEMBL26787770 0.76 GPR119 (0.39) GPR119CHRM4DPP4
SCHEMBL21705210 0.75 HTR4 (0.42) CHRM4DPP4
SCHEMBL26426644 0.75 PIM1 (0.35)
SCHEMBL23870910 0.74 GPR119 (0.40) GPR119CHRM4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11835859-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-05 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed