SCHEMBL26426679

SCHEMBL26426679

CC(C)(C)OC(=O)N1CCC(c2ccc(OC(=O)c3cc(I)cc(I)c3I)cc2)CC1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NAMPT P43490 1/20 0.46
KDM4E B2RXH2 3/20 0.43
MAPT P10636 1/20 0.43
THRB P10828 1/20 0.43
DDB1 Q16531 1/20 0.42
CRBN Q96SW2 1/20 0.42
GPR119 Q8TDV5 3/20 0.42
HTT P42858 2/20 0.42
ALDH1A1 P00352 3/20 0.41
PDE4B Q07343 1/20 0.41
P2RY14 Q15391 1/20 0.40
MEN1 O00255 2/20 0.40
KMT2A Q03164 2/20 0.40
HPGD P15428 2/20 0.40
TSHR P16473 1/20 0.40
CRHBP P24387 1/20 0.40
CRHR2 Q13324 1/20 0.40
HSD17B10 Q99714 1/20 0.40
JAK2 O60674 1/20 0.39
JAK3 P52333 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26807553 0.84 QDPR (0.40) ALDH1A1
SCHEMBL21705801 0.83 NAMPT (0.49) NAMPTKDM4EMAPTTHRBDDB1
SCHEMBL18788903 0.79 NAMPT (0.60) NAMPTKDM4EMAPTTHRBDDB1
SCHEMBL22277450 0.79 MAPT (0.42) KDM4EMAPTTHRBGPR119HTT
SCHEMBL26426678 0.77 QDPR (0.38) NAMPTP2RY14
SCHEMBL26426652 0.76 GPR119 (0.47) KDM4EMAPTTHRBGPR119
SCHEMBL23870909 0.76 NAMPT (0.52) NAMPTKDM4EMAPTTHRBDDB1
SCHEMBL22489653 0.75 ALDH1A1 (0.53) NAMPTKDM4EMAPTTHRBDDB1
SCHEMBL7871974 0.75 ALDH1A1 (0.67) NAMPTKDM4EMAPTTHRBGPR119
SCHEMBL4183397 0.75 GPR119 (0.61) NAMPTKDM4EMAPTTHRBDDB1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed