SCHEMBL21705236

SCHEMBL21705236

CCC(C)(C)OC(=O)N1CCC(CCOC(=O)c2c(I)ccc(I)c2I)CC1

nearest known ligand 0.40

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
GPR119 Q8TDV5 16/20 0.40
CHRM4 P08173 1/20 0.37
KDM4E B2RXH2 1/20 0.37
PKM P14618 1/20 0.37
NOTCH1 P46531 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21705235 0.90 GPR119 (0.48) GPR119KDM4EPKMNOTCH1
SCHEMBL22277398 0.83 GPR119 (0.34) GPR119KDM4EPKM
SCHEMBL26426653 0.82 GPR119 (0.39) GPR119CHRM4NOTCH1
SCHEMBL26787770 0.77 GPR119 (0.39) GPR119CHRM4KDM4EPKM
SCHEMBL23870910 0.75 GPR119 (0.40) GPR119CHRM4KDM4EPKM
SCHEMBL23871051 0.74 GPR119 (0.39) GPR119CHRM4KDM4EPKM
SCHEMBL21705234 0.74 ITGB3 (0.38)
SCHEMBL26426652 0.72 GPR119 (0.47) GPR119KDM4EPKM
SCHEMBL22277391 0.71 GPR119 (0.44) GPR119KDM4EPKM
SCHEMBL24466958 0.71 KDM4E (0.42) GPR119KDM4EPKM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 US disclosed
US-20200050105-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-02-13 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20200050105-A1 RESIST COMPOSITION AND PATTERNING PROCESS HNRNPU, HNRNPR, ZFR GPR119 905/4885CHRM4 2533/4885KDM4E 2329/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.