SCHEMBL26426656

SCHEMBL26426656

Nc1ccc(OC(=O)c2cc(I)cc(I)c2I)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HDAC6 Q9UBN7 2/20 0.44
MAPT P10636 2/20 0.44
LMNA P02545 1/20 0.44
TP53 P04637 1/20 0.44
CYP3A4 P08684 1/20 0.44
ADORA3 P0DMS8 1/20 0.44
CHRM1 P11229 1/20 0.44
TBXA2R P21731 1/20 0.44
SLC6A2 P23975 1/20 0.44
PDE4A P27815 1/20 0.44
ADRA1A P35348 1/20 0.44
KDR P35968 1/20 0.44
SLC6A3 Q01959 1/20 0.44
SMN1; SMN2 Q16637 1/20 0.44
KMT2A Q03164 5/20 0.43
ALDH1A1 P00352 2/20 0.43
F2 P00734 3/20 0.40
PRSS1 P07477 2/20 0.40
PRSS2 P07478 2/20 0.40
PRSS3 P35030 2/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26426657 0.84 MAPT (0.44) HDAC6MAPTLMNATP53CYP3A4
SCHEMBL19678505 0.83 TPMT (0.43) MAPTTP53KMT2AALDH1A1PKM
SCHEMBL21911755 0.81 MAPT (0.38) HDAC6MAPTLMNASMN1; SMN2KMT2A
SCHEMBL24361272 0.77 TRPV1 (0.36) HDAC6MAPTLMNATP53CYP3A4
SCHEMBL26426664 0.76 TSHR (0.46) HDAC6MAPTLMNATP53CYP3A4
SCHEMBL19678538 0.76 ESR1 (0.39) MAPTCYP3A4KMT2AALDH1A1KDM4E
SCHEMBL19678518 0.76 ALDH1A1 (0.38) MAPTALDH1A1PRSS1KDM4EPOLB
SCHEMBL26426675 0.76 F12 (0.36) HDAC6MAPTLMNATP53CYP3A4
SCHEMBL19756196 0.76 ELANE (0.32) GAA
SCHEMBL22403234 0.74 SCN9A (0.40) HDAC6MAPTKMT2AALDH1A1HDAC3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11835859-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-05 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed