SCHEMBL26426664

SCHEMBL26426664

Nc1ccccc1OC(=O)c1cc(I)cc(I)c1I

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.46
SMN1; SMN2 Q16637 2/20 0.46
APP P05067 1/20 0.39
HSD17B10 Q99714 6/20 0.36
ALDH1A1 P00352 6/20 0.36
CFTR P13569 1/20 0.36
KDM4E B2RXH2 3/20 0.36
HPGD P15428 2/20 0.36
LMNA P02545 2/20 0.35
CYP1A2 P05177 1/20 0.35
CYP2C9 P11712 1/20 0.35
HDAC6 Q9UBN7 2/20 0.34
HDAC3 O15379 1/20 0.34
HDAC4 P56524 1/20 0.34
HDAC1 Q13547 1/20 0.34
HDAC7 Q8WUI4 1/20 0.34
HDAC2 Q92769 1/20 0.34
HDAC10 Q969S8 1/20 0.34
HDAC11 Q96DB2 1/20 0.34
HDAC8 Q9BY41 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26426670 0.83 IDO1 (0.40) TSHRSMN1; SMN2HSD17B10HDAC6HDAC3
SCHEMBL26426677 0.80 NCEH1 (0.49) SMN1; SMN2HSD17B10ALDH1A1LMNACYP1A2
SCHEMBL26426675 0.76 F12 (0.36) SMN1; SMN2HSD17B10ALDH1A1KDM4EHPGD
SCHEMBL26426656 0.76 HDAC6 (0.44) SMN1; SMN2HSD17B10ALDH1A1KDM4EHPGD
SCHEMBL6430893 0.76 ALDH1A1 (0.60) TSHRSMN1; SMN2HSD17B10ALDH1A1CFTR
SCHEMBL26426657 0.75 MAPT (0.44) SMN1; SMN2APPHSD17B10ALDH1A1KDM4E
SCHEMBL21705807 0.74 SMN1; SMN2 (0.46) TSHRSMN1; SMN2APPHSD17B10ALDH1A1
SCHEMBL21912400 0.72 TTR (0.38) SMN1; SMN2HSD17B10ALDH1A1CYP1A2KMT2A
SCHEMBL21912401 0.72 ESR1 (0.34) SMN1; SMN2HSD17B10ALDH1A1KDM4EHPGD
SCHEMBL8632649 0.72 MAPT (0.50) TSHRSMN1; SMN2HSD17B10ALDH1A1CFTR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11835859-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-05 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed