SCHEMBL26426657

SCHEMBL26426657

Nc1cccc(OC(=O)c2cc(I)cc(I)c2I)c1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 5/20 0.44
CYP3A4 P08684 3/20 0.44
TP53 P04637 2/20 0.44
SMN1; SMN2 Q16637 2/20 0.44
HDAC6 Q9UBN7 2/20 0.44
LMNA P02545 1/20 0.44
ADORA3 P0DMS8 1/20 0.44
CHRM1 P11229 1/20 0.44
TBXA2R P21731 1/20 0.44
SLC6A2 P23975 1/20 0.44
PDE4A P27815 1/20 0.44
ADRA1A P35348 1/20 0.44
KDR P35968 1/20 0.44
SLC6A3 Q01959 1/20 0.44
F2 P00734 1/20 0.42
APP P05067 1/20 0.39
KMT2A Q03164 4/20 0.38
ALDH1A1 P00352 2/20 0.38
MEN1 O00255 1/20 0.38
MAOB P27338 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26426656 0.84 HDAC6 (0.44) MAPTCYP3A4TP53SMN1; SMN2HDAC6
SCHEMBL28261883 0.78 MAPT (0.58) MAPTCYP3A4TP53SMN1; SMN2HDAC6
SCHEMBL21705805 0.77 KMT2A (0.43) MAPTCYP3A4TP53SMN1; SMN2HDAC6
SCHEMBL26426664 0.75 TSHR (0.46) MAPTCYP3A4TP53SMN1; SMN2HDAC6
SCHEMBL26426675 0.75 F12 (0.36) MAPTCYP3A4TP53SMN1; SMN2HDAC6
SCHEMBL17744895 0.74 SMN1; SMN2 (0.54) MAPTCYP3A4TP53SMN1; SMN2HDAC6
SCHEMBL19678505 0.74 TPMT (0.43) MAPTTP53KMT2AALDH1A1MEN1
SCHEMBL13292720 0.73 PRSS1 (0.51) MAPTCYP3A4TP53SMN1; SMN2HDAC6
SCHEMBL30473277 0.73 PRSS1 (0.51) MAPTCYP3A4TP53SMN1; SMN2HDAC6
SCHEMBL28261885 0.73 MAPT (0.60) MAPTCYP3A4TP53SMN1; SMN2HDAC6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11835859-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-05 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed