SCHEMBL26426675

SCHEMBL26426675

Nc1cc(OC(=O)c2cc(I)cc(I)c2I)cc2ccccc12

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
F12 P00748 1/20 0.36
KMT2A Q03164 6/20 0.35
MAPT P10636 4/20 0.35
KDM4E B2RXH2 4/20 0.35
MEN1 O00255 4/20 0.35
TDP1 Q9NUW8 2/20 0.35
HDAC6 Q9UBN7 2/20 0.35
LMNA P02545 1/20 0.35
TP53 P04637 1/20 0.35
CYP3A4 P08684 1/20 0.35
ADORA3 P0DMS8 1/20 0.35
CHRM1 P11229 1/20 0.35
TBXA2R P21731 1/20 0.35
SLC6A2 P23975 1/20 0.35
PDE4A P27815 1/20 0.35
ADRA1A P35348 1/20 0.35
KDR P35968 1/20 0.35
SLC6A3 Q01959 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
IDO1 P14902 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21705803 0.80 MAPT (0.36) F12KMT2AMAPTKDM4EMEN1
SCHEMBL26426677 0.79 NCEH1 (0.49) KMT2AMAPTMEN1LMNACYP3A4
SCHEMBL26426670 0.77 IDO1 (0.40) KMT2AMAPTMEN1HDAC6SMN1; SMN2
SCHEMBL26426664 0.76 TSHR (0.46) KMT2AMAPTKDM4ETDP1HDAC6
SCHEMBL26426656 0.76 HDAC6 (0.44) KMT2AMAPTKDM4EMEN1TDP1
SCHEMBL26426657 0.75 MAPT (0.44) KMT2AMAPTKDM4EMEN1TDP1
SCHEMBL26784495 0.69 CDC25B (0.36) KMT2AKDM4EMEN1CYP3A4IDO1
SCHEMBL21912401 0.69 ESR1 (0.34) KMT2AMAPTKDM4EMEN1SMN1; SMN2
SCHEMBL19678505 0.69 TPMT (0.43) KMT2AMAPTKDM4EMEN1TP53
SCHEMBL26785193 0.69 IDO1 (0.37) KMT2AMAPTKDM4EMEN1TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11835859-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-05 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed