SCHEMBL26426677

SCHEMBL26426677

Nc1c(OC(=O)c2cc(I)cc(I)c2I)ccc2ccccc12

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NCEH1 Q6PIU2 7/20 0.49
KMT2A Q03164 4/20 0.41
GAA P10253 2/20 0.41
POLB P06746 1/20 0.41
MAPT P10636 4/20 0.38
HTT P42858 2/20 0.38
CYP1A1 P04798 1/20 0.36
CYP1B1 Q16678 1/20 0.36
ALDH1A1 P00352 2/20 0.35
SMN1; SMN2 Q16637 2/20 0.35
CYP1A2 P05177 1/20 0.35
CYP3A4 P08684 1/20 0.35
CYP2C9 P11712 1/20 0.35
ALOX12 P18054 1/20 0.35
CYP2C19 P33261 1/20 0.35
HSD17B10 Q99714 1/20 0.35
MEN1 O00255 1/20 0.34
LMNA P02545 2/20 0.34
ALOX5 P09917 2/20 0.34
RAB9A P51151 2/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26426670 0.83 IDO1 (0.40) NCEH1KMT2AGAAPOLBMAPT
SCHEMBL26426664 0.80 TSHR (0.46) KMT2AGAAPOLBMAPTALDH1A1
SCHEMBL26426675 0.79 F12 (0.36) KMT2AGAAPOLBMAPTALDH1A1
SCHEMBL21705800 0.77 NCEH1 (0.52) NCEH1KMT2AGAAPOLBMAPT
SCHEMBL21912401 0.75 ESR1 (0.34) KMT2AGAAMAPTHTTALDH1A1
SCHEMBL26426656 0.71 HDAC6 (0.44) KMT2AGAAPOLBMAPTHTT
SCHEMBL26426657 0.70 MAPT (0.44) KMT2AGAAPOLBMAPTALDH1A1
SCHEMBL21912400 0.70 TTR (0.38) KMT2AGAAPOLBMAPTHTT
SCHEMBL23843644 0.69 CA2 (0.38) KMT2AMEN1
SCHEMBL19678544 0.69 CDC25B (0.36) KMT2AGAAPOLBMAPTHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11835859-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-05 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed